Catalytic Chemical Vapor Deposition Apparatus
Abstract
[Object] To provide a catalytic chemical vapor deposition apparatus capable of prolonging the service life of a catalyst wire. [Solving Means] In a catalytic chemical vapor deposition apparatus ( 1 ) according to the present invention, a catalyst wire ( 6 ) including a tantalum wire and a boride layer formed on a surface of the tantalum wire is used. The boride of the metal tantalum (tantalum boride) is harder than the metal tantalum. Therefore, by using the tantalum wire having the boride layer formed on the surface thereof as a catalyst wire, it is possible to reduce thermal expansion of the catalyst wire, improve mechanical strength, and prolong the service life. Further, by performing energization heating of the catalyst wire ( 6 ) by continuous energization, it is further possible to prolong the service life of the catalyst wire ( 6 ).
Claims
exact text as granted — not AI-modified1 . A catalytic chemical vapor deposition apparatus, comprising:
a reaction chamber; a gas introduction source to introduce a source gas to the reaction chamber; a catalyst wire including a tantalum wire and a boride layer formed on a surface of the tantalum wire, and arranged to be opposed to a substrate to be processed that is installed in the reaction chamber; and a heat source to heat the catalyst wire.
2 . The catalytic chemical vapor deposition apparatus according to claim 1 , further comprising a control means for performing energization heating of the catalyst wire with the heat source by continuous energization.Join the waitlist — get patent alerts
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