US2011215416A1PendingUtilityA1
Carbon nanotube n-doping material, carbon nanotube n-doping method and device using the same
Est. expiryJun 5, 2028(~1.8 yrs left)· nominal 20-yr term from priority
B82Y 30/00Y10S977/742C01B 2204/22Y10S977/745C01B 2202/22C01B 32/168B82Y 10/00C07D 213/82Y10S977/746Y10S977/795B82Y 40/00Y10S977/788H10K 71/30H10K 85/221
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Claims
Abstract
Nicotinamide and/or a compound which is chemically combined with nicotinamide may be used as a carbon nanotube (“CNT”) n-doping material. CNTs n-doped with the CNT n-doping material may have long-lasting doping stability in the air without de-doping. Further, CNT n-doping state may be easily controlled when using the CNT n-doping material. The CNT n-doping material and/or CNTs n-doped with the CNT n-doping material may be used for various applications.
Claims
exact text as granted — not AI-modified1 .- 19 . (canceled)
20 . A device comprising: a CNT n-doped with a material comprising nicotinamide or a compound which is chemically combined with the nicotinamide.
21 . The device according to claim 20 , wherein the compound which is chemically combined with nicotinamide is at least one selected from the group consisting of nicotinamide mononucleotide (NMN), a nicotinamide adenine dinucleotide (NAD), a nicotinamide adenine dinucleotide phosphate (NADP), reduced nicotinamide mononucleotide (NMNH), a reduced nicotinamide adenine dinucleotide (NADH) and a reduced nicotinamide adenine dinucleotide phosphate (NADPH).
22 . The device according to claim 20 , wherein the device is a field-effect transistor.
23 . The device according to claim 20 , wherein the device is a p-n junction diode.
24 . The device according to claim 20 , wherein the device is a complementary metal oxide semiconductor (CMOS).
25 . The device according to claim 22 , wherein the field-effect transistor comprises
a gate; a source electrode and a drain electrode on the gate; and a CNT channel between the source electrode and the drain electrode.
26 . The device according to claim 25 , wherein a portion of the CNT channel close to the drain electrode comprises a CNT n-doped with a material comprising nicotinamide or a compound which is chemically combined with the nicotinamide.
27 . The device according to claim 26 , wherein the field-effect transistor further comprises a photoresist layer on the remaining portion of the CNT channel close to the source electrode.
28 . The device according to claim 23 , wherein the p-n junction diode comprises
a substrate; a first electrode and a second electrode on the substrate; and a CNT channel formed between the first electrode and the second electrode.
29 . The device according to claim 28 , wherein a half of the CNT channel comprises a CNT n-doped with a material comprising nicotinamide or a compound which is chemically combined with the nicotinamide.
30 . The device according to claim 29 , the p-n junction diode further comprises a photoresist layer which protects the remaining half of the CNT channel from the n-doping.
31 . The device according to claim 24 , wherein the complementary metal oxide semiconductor (CMOS) comprises
a gate; a p-type transistor and an n-type transistor on the gate; and CNT channels formed between electrodes at the p-type transistor and the n-type transistor.
32 . The device according to claim 31 , wherein the CNT channel formed between electrodes at the n-type transistor comprises a CNT n-doped with a material comprising nicotinamide or a compound which is chemically combined with the nicotinamide.Join the waitlist — get patent alerts
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