US2011210248A1PendingUtilityA1

Charged particle beam instrument comprising an aberration corrector

Assignee: HITACHI HIGH TECH CORPPriority: Dec 21, 2006Filed: Feb 25, 2011Published: Sep 1, 2011
Est. expiryDec 21, 2026(~0.4 yrs left)· nominal 20-yr term from priority
H01J 37/28H01J 2237/216H01J 37/222H01J 37/21
50
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

A method for estimation of a probe shape, in a scanning electron microscope provided with an aberration corrector, and the method is designed so as to obtain a probe image, by inputting to a computer an image taken in a just-focused state and an image taken in a de-focused state, as an image data; preparing a correlation window by automatically determining a size of a correlation window image, based on an input data size and an output data size; executing cross-correlation calculation between the correlation window and a reference area; and repeating this calculation while shifting the reference area, so as to obtain a cross-correlation matrix, in order to stably obtain the probe image, without receiving effects of use conditions or noises.

Claims

exact text as granted — not AI-modified
1 . (canceled) 
     
     
         2 . A charged particle beam instrument comprising an aberration corrector provided with a charged particle beam to output the secondary particles as secondary particle signals by irradiating an aberration corrected convergent charged particle beam onto a specimen, and
 a computer for acquiring information on irradiation region of said convergent charged particle beam by processing of said secondary particle signals,   wherein said computer computes a brightness distribution data corresponding to said convergent charged particle beam by processing of said secondary particle signals and estimates aberration and species from said brightness distribution data corresponding to said convergent charged particle beam and calculates applied currents and voltages for the aberration corrector from estimated aberration amounts and species and sends information of applied currents and voltages to the aberration corrector and controls currents of voltages of the aberration corrector.   
     
     
         3 . A charged particle beam instrument comprising an aberration corrector according to  claim 1 ,
 wherein the instrument comprises a computer for iterating control of currents and voltages of the aberration corrector until estimated aberration amounts achieve target aberration amounts set in advance by comparing said estimated aberration amounts and said target aberration amounts.

Join the waitlist — get patent alerts

Track US2011210248A1 — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.