US2011151120A1PendingUtilityA1

Surface treating method for making the same

Assignee: HON HAI PREC IND CO LTDPriority: Oct 25, 2007Filed: Mar 7, 2011Published: Jun 23, 2011
Est. expiryOct 25, 2027(~1.2 yrs left)· nominal 20-yr term from priority
G06F 1/1613G06F 1/1656Y10T428/1352Y10T428/1355Y10T428/1321Y10T428/239Y10T428/1359
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Claims

Abstract

A surface treating method for making a housing having a main body includes forming a plating layer on the main body, coating an adhesive on the plating layer to form an adhesive layer, and coating a lacquer on the adhesive layer to form an outer layer. The adhesive comprises polyolefin chloride.

Claims

exact text as granted — not AI-modified
1 . A surface treating method for making a housing having a main body, comprising:
 forming a plating layer on the main body;   coating an adhesive on the plating layer to form an adhesive layer; and   coating a lacquer on the adhesive layer to form an outer layer.   
     
     
         2 . The surface treating method as claimed in  claim 1 , wherein the adhesive comprises polyolefin chloride. 
     
     
         3 . The surface treating method as claimed in  claim 1 , wherein the step of forming a plating layer is done by performing a physical vapor deposition method, a non-conductive vacuum metallization method or a chemical vapor deposition method. 
     
     
         4 . A surface treating method for making a housing have a main body comprising:
 coating a primer on the main body to form a bottom layer;   forming a plating layer on the bottom layer;   coating an adhesive on the plating layer to form an adhesive layer; and   coating a lacquer on the adhesive layer to form an outer layer.   
     
     
         5 . The surface treating method as claimed in  claim 4 , wherein the adhesive comprises polyolefin chloride. 
     
     
         6 . The surface treating method as claimed in  claim 4 , wherein the step of depositing a plating layer is done by performing a physical vapor deposition method, a non-conductive vacuum metallization method or a chemical vapor deposition method.

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