Chemical Mechanical Planarization Pad With Surface Characteristics

Abstract

A polishing pad includes a polymer matrix and polyhedral oligomeric silsequioxane (“POSS”) molecules or soluble particles and a surfactant dispersed within the polymer matrix. A polishing pad can be formed by casting a liquid polymer on a conveyer belt having a casting surface with a set of projections and curing the liquid polymer on the conveyer belt such that a polymer matrix has a surface with a second set of projections complimentary to the first set of projections.

1 . A polishing pad comprising:
 a polymer matrix; and   polyhedral oligomeric silsequioxane (“POSS”) molecules dispersed within the polymer matrix.   
     
     
         2 . The polishing pad of  claim 1 , wherein the POSS molecules are chemically linked to the polymer matrix. 
     
     
         3 . The polishing pad of  claim 1 , wherein the POSS molecules include a functional group, and wherein the functional group is selected from a group consisting of NH 2 , OH, SH, R—NH, —NCO, and COOH. 
     
     
         4 . The polishing pad of  claim 1 , wherein the polymer matrix comprises polyurethane. 
     
     
         5 . The polishing pad of  claim 1 , wherein the polymer matrix is porous. 
     
     
         6 . The polishing pad of  claim 5 , wherein the pores of the polymer matrix are filled with a gas. 
     
     
         7 . The polishing pad of  claim 5 , wherein the pores of the polymer matrix comprise 15-40% of the polishing pad by volume. 
     
     
         8 . The polishing pad of  claim 1 , wherein the hardness of the polishing pad is between approximately 40 and 75 Shore D. 
     
     
         9 . The polishing pad of  claim 1 , wherein the POSS molecules comprise approximately 5 to 15 percent of the polishing pad by weight. 
     
     
         10 . A method of making a polishing pad comprising:
 mixing a polymer solution and polyhedral oligomeric silsequioxane (“POSS”) molecules together to form a mix; and   curing the mix such that a polymer matrix having POSS particles is formed.   
     
     
         11 . The method of  claim 10 , wherein the polymer solution comprises polyurethane. 
     
     
         12 . The method of  claim 10 , further comprising bubbling gas through the mix prior to curing. 
     
     
         13 . A polishing pad comprising:
 a polymer matrix;   soluble particles dispersed within the polymer matrix; and   a surfactant dispersed within the polymer matrix.   
     
     
         14 . The polishing pad of  claim 13 , wherein the polymer matrix is porous. 
     
     
         15 . The polishing pad of  claim 13 , wherein the soluble particles are chosen from a group consisting of CaCO 3 , K 2 SO 4 , phenolic novolac, and polyethylene glycol ether. 
     
     
         16 . The polishing pad of  claim 13 , wherein the soluble particles are approximately 1 to 25 micrometers in size. 
     
     
         17 . The polishing pad of  claim 13 , wherein the soluble particles comprise approximately 1 to 15% of the polishing pad by weight. 
     
     
         18 . The polishing pad of  claim 13 , wherein the polymer matrix comprises polyurethane. 
     
     
         19 . The polishing pad of  claim 13 , wherein the surfactant is chosen from a group consisting of copolymers, block copolymers, and nonionic surfactants. 
     
     
         20 . The polishing pad of  claim 15 , wherein the hardness of the polishing pad is between approximately 60 and 75 Shore D. 
     
     
         21 . A method of making a polishing pad comprising:
 casting a liquid polymer on a conveyer belt, wherein the conveyer belt comprises a casting surface with a first set of projections; and   curing the liquid polymer on the conveyer belt such that a polymer matrix is formed, wherein the polymer matrix has a surface with a second set of projections, the second set of projections being complimentary to the first set of projections.   
     
     
         22 . The method of  claim 21 , further comprising injecting a gas through the liquid polymer prior to casting. 
     
     
         23 . The method of  claim 21 , wherein the casting surface of the conveyer belt comprises a material chosen from a group consisting of stainless steel, Teflon, and silicone. 
     
     
         24 . The method of  claim 21 , wherein the polymer comprises polyurethane.