Electro-Optical Device and Method of Manufacturing the Same

Abstract

In a liquid crystal display device, gate lines and common lines are first concurrently formed, and after an interlayer film is formed, a pixel electrode, common electrodes, and source lines are formed at the same time. By this, a electrode pattern can be made simple and manufacturing steps are simplified. Further, wiring lines and electrode disposed in the layer closest to a liquid crystal layer are made the pixel electrode, common electrodes and source lines, and the shapes thereof are made simple.

1 . An electro-optical device comprising a wiring connection terminal for an external device, the wiring connection terminal being formed of a laminated layer of at least two wiring lines. 
     
     
         2 . A device according to  claim 1 , wherein the laminated layer of wiring lines is formed of the same material and by the same step. 
     
     
         3 . A device according to  claim 1 , wherein the wiring connection terminal is made of aluminum, metal mainly containing wiring connection terminalaluminum, conductive inorganic compound, silicon, or a laminated layer of titanium and aluminum. 
     
     
         4 . An electro-optical device comprising a wiring connection terminal for an external device, the wiring connection terminal being formed of a silicon film formed on an insulating substrate, and of a laminated layer of at least two wiring lines on the silicon film. 
     
     
         5 . A device according to  claim 4 , wherein the laminated layer of wiring lines is formed of the same material and by the same step. 
     
     
         6 . A device according to  claim 4 , wherein the wiring connection terminal is made of aluminum, metal mainly containing aluminum, conductive inorganic compound, silicon, or a laminated layer of titanium and aluminum. 
     
     
         7 . A method of manufacturing an electro-optical comprising the steps of:
 forming a first conductive film over a substrate having an insulating surface;   shaping the first conductive film into a first wiring terminal;   forming a second conductive film over the first conductive film;   shaping the second conductive film into a second wiring terminal;   forming an interlayer insulating film over an entire surface of the substrate; and   shaving off the interlayer insulating film to expose an upper surface of the second wiring terminal to form a wiring connection terminal for an external device.   
     
     
         8 . The method according to  claim 7 ,
 wherein the first conductive film and the second conductive film are respectively shaped by photolithography.   
     
     
         9 . The method according to  claim 7 ,
 wherein the first conductive film is made of Cr, Al, Ta, or Ti.   
     
     
         10 . A method of manufacturing an electro-optical device, comprising the steps of:
 forming a semiconductor layer over a substrate having an insulating surface;   forming a first conductive film over the semiconductor layer;   shaping the first conductive film into a first wiring terminal;   forming a second conductive film over the first conductive film;   shaping the second conductive film into a second wiring terminal;   forming an interlayer insulating film over an entire surface of the substrate; and   shaving off the interlayer insulating film to expose an upper surface of the second wiring terminal to form a wiring connection terminal for an external device.   
     
     
         11 . The method according to  claim 10 ,
 wherein the first conductive film and the second conductive film are respectively shaped by photolithography.   
     
     
         12 . The method according to  claim 10 ,
 wherein the first conductive film is made of Cr, Al, Ta, or Ti.