US2011094895A1PendingUtilityA1
Optical detection of planarization, breakthrough and end-point in membrane-mediated electropolishing of metal layers
Est. expiryMay 20, 2025(expired)· nominal 20-yr term from priority
Inventors:Stephen Mazur
C25F 7/00C25F 3/16
40
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Claims
Abstract
Methods and apparatus for monitoring in situ the progress of planarization and/or removal of a thin metal layer from a substrate during membrane-mediated electropolishing processes are provided.
Claims
exact text as granted — not AI-modified1 . An apparatus for use in membrane-mediated electropolishing a metal-coated workpiece comprising:
A. a cathode half-cell comprising:
1) a fully or partially enclosed volume, cavity or vessel;
2) a charge-selective ion-conducting membrane having an internal surface and an external surface, wherein the membrane forms a surface of the enclosed volume, cavity or vessel;
3) an electrolyte composition which at least partially fills the enclosed volume, cavity or vessel, wherein at least a portion of the internal surface of the membrane contacts the electrolyte composition and at least a portion of the external surface of the membrane contacts the work-piece during electropolishing; and
4) an electrode in contact with the electrolyte composition; and
B. an optical detection system comprising:
1) a light source for illuminating the workpiece; and
2) a means for detecting light that is reflected from the workpiece.
2 . The apparatus of claim 1 , wherein the means for detecting light that is reflected from the workpiece is located within the enclosed volume of the cathode half-cell and the membrane and electrolyte are optically transparent.
3 . The apparatus of claim 1 , wherein the means for detecting light that is reflected from the workpiece comprises an optical fiber and a photovoltaic transducer.
4 . The apparatus of claim 3 , wherein the optical fiber is bifurcated.
5 . The apparatus of claim 1 , wherein the membrane comprises a perfluorosulfonate ionomer.
6 . A process comprising:
A. providing a light source for illuminating a workpiece being electropolished by MMEP; B. illuminating the workpiece with light from the light source; C. detecting light reflected from the workpiece; and D. analyzing the reflected light to determine the topography of the workpiece.Join the waitlist — get patent alerts
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