US2011062457A1PendingUtilityA1
Semiconductor light emitting device, method of manufacturing the same, image display device, and electronic apparatus
Est. expirySep 15, 2029(~3.1 yrs left)· nominal 20-yr term from priority
Inventors:Hiroki NaitoTakahiro KoyamaKensuke KojimaArata KobayashiHiroyuki OkuyamaMakoto OoganeTakayuki Kawasumi
H10H 20/857H10H 20/819H10H 20/032H10H 20/013H10H 29/142H10H 20/831H10H 20/824
50
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Claims
Abstract
A semiconductor light emitting device including an active layer, a compound semiconductor layer on the active layer, a contact layer on the compound semiconductor layer, and an electrode on the contact layer, where the contact layer is substantially the same size as the electrode.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A semiconductor light emitting device comprising:
a first compound semiconductor layer; an active layer on the first compound semiconductor layer; a second compound semiconductor layer on the active layer, the second compound semiconductor layer including a clad layer and a contact layer in this order from the active layer side; and an electrode on the contact layer, wherein the contact layer is smaller than the clad layer.
2 . The semiconductor light emitting device of claim 1 , wherein the contact layer is substantially the same size as the electrode.
3 . The semiconductor light emitting device of claim 1 , wherein the electrode covers the contact layer.
4 . The semiconductor light emitting device of claim 2 , wherein the average area S 1 of the contact layer and the average area S 2 of the electrode satisfy the relation of ½≦S 2 /S 1 ≦2.
5 . The semiconductor light emitting device of claim 2 , wherein the average area S 1 of the contact layer and the average area S 2 of the electrode satisfy the relation of S 2 /S 1 =1.05.
6 . The semiconductor light emitting device of claim 1 , wherein the active layer includes a GaInP compound semiconductor layer and is doped with an impurity.
7 . The semiconductor light emitting device of claim 6 , wherein the doping concentration of an n-type impurity in the active layer is in the range of 5×10 15 /cm 3 to 1×10 18 /cm 3 .
8 . The semiconductor light emitting device of claim 6 , wherein the first compound semiconductor layer includes a first AlGaInP compound semiconductor layer, and the clad layer is a second AlGaInP compound semiconductor layer.
9 . The semiconductor light emitting device of claim 8 , wherein the first compound semiconductor is n-type, and the second compound semiconductor is p-type.
10 . An image display device including:
a plurality of light emitting devices each including
a first compound semiconductor layer;
an active layer on the first compound semiconductor layer;
a second compound semiconductor layer on the active layer, the second compound semiconductor layer including a clad layer and a contact layer in this order from the active layer side; and
an electrode on the contact layer,
wherein the contact layer is smaller than the clad layer.
11 . A method of manufacturing a semiconductor light emitting device including the steps of:
forming a first compound semiconductor layer; forming an active layer on the first compound semiconductor layer; forming a second compound semiconductor layer on the active layer, the second compound semiconductor layer including a clad layer and a contact layer in this order from the active layer side; and forming an electrode on the contact layer, wherein the contact layer is smaller than the clad layer.Join the waitlist — get patent alerts
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