Plasma etching device

Abstract

A plasma etching device is provided. The device includes a chamber, a cathode assembly, and an integral cathode liner. The chamber provides a plasma reaction space. The cathode assembly is positioned at an inner and central part of the chamber and supports a substrate. The integral cathode liner has a plurality of first vents and second vents formed at two levels and spaced apart respectively such that the uniformity of a gas flow and exhaust flow within the chamber is maintained, and is outer inserted to the cathode assembly and coupled at its lower end part to an inner surface of the chamber.

What is claimed is: 
     
         1 . A plasma etching device comprising:
 a chamber for providing a plasma reaction space;   a cathode assembly positioned at an inner and central part of the chamber and supporting a substrate; and   an integral cathode liner having a plurality of first vents and second vents formed at two levels and spaced apart respectively such that the uniformity of a gas flow and exhaust flow within the chamber is maintained, and being outer inserted to the cathode assembly and coupled at its lower end part to an inner surface of the chamber.   
     
     
         2 . The device of  claim 1 , wherein the cathode liner comprises:
 a baffle plate having the first vents radially arranged;   a liner part of a constant length coupled at its upper end to an inner circumference of the baffle plate; and   an exhaust part provided in a lower end part of the liner part and coupled to the chamber, and having the second vents radially arranged.   
     
     
         3 . The device of  claim 2 , wherein the first vents of the baffle plate are comprised of slots spaced apart and arranged at regular intervals. 
     
     
         4 . The device of  claim 3 , wherein an inner circumference of the baffle plate is screw coupled at its several places to the upper end surface of the liner part. 
     
     
         5 . The device of  claim 2 , wherein the exhaust part comprises:
 an exhaust plate having the second vents through provided at a constant interval, the second vents being provided to be slope at a constant angle in an outside direction; and   a coupling plate extending outside along an outer circumference of a lower end part of the exhaust plate and being screw coupled to the chamber.   
     
     
         6 . The device of  claim 5 , wherein a control plate sliding and rotating is provided on an upper surface of the exhaust plate, and the control plate has a plurality of control ports arranged and formed corresponding to the plurality of second vents to simultaneously control aperture ratios of the second vents. 
     
     
         7 . The device of  claim 5 , wherein a plurality of individual control plates are provided on the upper surface of the exhaust plate to be slidable on an upper part of the exhaust plate to control each of the aperture ratios of the plurality of second vents. 
     
     
         8 . The device of  claim 5 , further comprising a gasket for preventing a leakage of a reaction gas at a lower side surface of the coupling plate. 
     
     
         9 . The device of  claim 1 , wherein the cathode liner is coated with aluminum oxide (Al 2 O 3 ), yttrium oxide (Y 2 O 3 ).