Information processing apparatus, semiconductor manufacturing system, information processing method, and storage medium

Abstract

A information processing apparatus 100 for processing an acquired value, which is a value acquired in regard to a state during a treatment, performed by a semiconductor manufacturing apparatus 200 for performing a treatment on a treatment target containing a semiconductor according to a set value, which is a value for setting a condition of a treatment, includes: a set value receiving portion 101 for receiving the set value; a state value receiving portion 102 for receiving the acquired value; a correction amount calculating portion 103 for calculating a correction amount of the acquired value, using a correction function indicating a relationship between the set value and the acquired value; a correcting portion 104 for correcting the acquired value received by the state value receiving portion 102 , using the correction amount calculated by the correction amount calculating portion 103 ; and an output portion 105 for outputting a result of correction performed by the correcting portion 104.

1 . An information processing apparatus for processing a state value, which is a value relating to a state during a treatment, performed by a semiconductor manufacturing apparatus for performing a treatment on a treatment target containing a semiconductor, comprising:
 a state value receiving portion that receives the state value;   a standard value storage portion in which a standard value, which is a value serving as standard for the state value, can be stored;   a threshold value storage portion in which a threshold value, which is a value used for judging whether or not the state value is a desired value, can be stored;   a calculating portion that calculates a ratio between a value relating to a difference between the state value received by the state value receiving portion and the standard value, and a value relating to a difference between the threshold value and the standard value; and   an output portion that outputs the ratio calculated by the calculating portion.   
     
     
         2 . The information processing apparatus according to  claim 1 ,
 wherein the state value receiving portion receives multiple state values in different measurement units,   the calculating portion calculates the ratio corresponding to each of the multiple state values in different measurement units, and   the output portion outputs the multiple ratios calculated by the calculating portion.   
     
     
         3 . The information processing apparatus according to  claim 2 , wherein the multiple state values in different measurement units are a measured value of temperature inside the semiconductor manufacturing apparatus and a measured value of pressure inside the semiconductor manufacturing apparatus, or values obtained by statistically processing the measured values. 
     
     
         4 . The information processing apparatus according to  claim 3 , wherein the multiple state values in different measurement units further include a measured value of flow rate of gas introduced into the semiconductor manufacturing apparatus, or a value obtained by statistically processing the measured value. 
     
     
         5 . The information processing apparatus according to  claim 1 , wherein the threshold value used by the calculating portion for calculating a ratio is a value in a subrange to which the state value belongs, of a possible range of the state value that is divided into two subranges by the standard value. 
     
     
         6 . The information processing apparatus according to  claim 1 , wherein the state value is a measured value of temperature inside the semiconductor manufacturing apparatus, or a value obtained by statistically processing the measured value. 
     
     
         7 . The information processing apparatus according to  claim 1 , wherein the state value is a measured value of pressure inside the semiconductor manufacturing apparatus, or a value obtained by statistically processing the measured value. 
     
     
         8 . The information processing apparatus according to  claim 1 , wherein the state value is a measured value of flow rate of gas introduced into the semiconductor manufacturing apparatus, or a value obtained by statistically processing the measured value. 
     
     
         9 . A semiconductor manufacturing system, comprising a semiconductor manufacturing apparatus for performing a treatment on a treatment target containing a semiconductor, and the information processing apparatus according to  claim 1 ,
 wherein the semiconductor manufacturing apparatus comprises:
 a treatment state value acquiring portion that acquires the state value; and 
 a treatment output portion that outputs the state value. 
   
     
     
         10 . The semiconductor manufacturing system according to  claim 9 ,
 wherein the semiconductor manufacturing apparatus further comprises:
 a treatment vessel in which a treatment is performed on the treatment target; and 
 at least one temperature detecting portion that detects temperature inside the treatment vessel, and 
   the treatment state value acquiring portion acquires a state value that is a value of temperature detected by the temperature detecting portion, or a value obtained by statistically processing the value.   
     
     
         11 . The semiconductor manufacturing system according to  claim 9 ,
 wherein the semiconductor manufacturing apparatus further comprises:
 a treatment vessel in which a treatment is performed on the treatment target; and 
 a pressure detecting portion that detects pressure inside the treatment vessel, and 
   the treatment state value acquiring portion acquires a state value that is a value of pressure detected by the pressure detecting portion, or a value obtained by statistically processing the value.   
     
     
         12 . The semiconductor manufacturing system according to  claim 9 ,
 wherein the semiconductor manufacturing apparatus further comprises:
 a treatment vessel in which a treatment is performed on the treatment target; and 
 a gas flow rate detecting portion that detects flow rate of gas introduced into the treatment vessel, and 
   the treatment state value acquiring portion acquires a state value that is a value of gas flow rate detected by the gas flow rate detecting portion, or a value obtained by statistically processing the value.   
     
     
         13 . An information processing apparatus for processing a state value, which is a value relating to a state during a treatment, performed by a semiconductor manufacturing apparatus for performing a treatment on a treatment target containing a semiconductor, comprising:
 a state value receiving portion that receives the multiple state values in different measurement units;   a standard value storage portion in which a standard value, which is a value serving as standard for the state value, can be stored;   a threshold value storage portion in which a threshold value, which is a value used for judging whether or not the state value is a desired value, can be stored;   a calculating portion that calculates, for each of the multiple state values in different measurement units, a ratio between a value relating to a difference between the state value received by the state value receiving portion and the standard value, and a value relating to a difference between the threshold value and the standard value;   a multivariate analysis portion that performs multivariate analysis, using the multiple ratios calculated by the calculating portion; and   an output portion that outputs a result of analysis performed by the multivariate analysis portion.   
     
     
         14 . The information processing apparatus according to  claim 13 , wherein the threshold value used by the calculating portion for calculating a ratio is a value in a subrange to which the state value belongs, of a possible range of the state value that is divided into two subranges by the standard value. 
     
     
         15 . The information processing apparatus according to  claim 13 , wherein the state value is a measured value of temperature inside the semiconductor manufacturing apparatus, or a value obtained by statistically processing the measured value. 
     
     
         16 . The information processing apparatus according to  claim 13 , wherein the state value is a measured value of pressure inside the semiconductor manufacturing apparatus, or a value obtained by statistically processing the measured value. 
     
     
         17 . The information processing apparatus according to  claim 13 , wherein the state value is a measured value of flow rate of gas introduced into the semiconductor manufacturing apparatus, or a value obtained by statistically processing the measured value. 
     
     
         18 . The information processing apparatus according to  claim 13 , wherein the multiple state values in different measurement units are a measured value of temperature inside the semiconductor manufacturing apparatus and a measured value of pressure inside the semiconductor manufacturing apparatus, or values obtained by statistically processing the measured values. 
     
     
         19 . The information processing apparatus according to  claim 18 , wherein the multiple state values in different measurement units further include a measured value of flow rate of gas introduced into the semiconductor manufacturing apparatus, or a value obtained by statistically processing the measured value. 
     
     
         20 . A semiconductor manufacturing system, comprising a semiconductor manufacturing apparatus for performing a treatment on a treatment target containing a semiconductor, and the information processing apparatus according to  claim 13 ,
 wherein the semiconductor manufacturing apparatus comprises:
 a treatment state value acquiring portion that acquires the state value; and 
 a treatment output portion that outputs the state value. 
   
     
     
         21 . The semiconductor manufacturing system according to  claim 20 ,
 wherein the semiconductor manufacturing apparatus further comprises:
 a treatment vessel in which a treatment is performed on the treatment target; and 
 at least one temperature detecting portion that detects temperature inside the treatment vessel, and 
   the treatment state value acquiring portion acquires a state value that is a value of temperature detected by the temperature detecting portion, or a value obtained by statistically processing the value.   
     
     
         22 . The semiconductor manufacturing system according to  claim 20 ,
 wherein the semiconductor manufacturing apparatus further comprises:
 a treatment vessel in which a treatment is performed on the treatment target; and 
 a pressure detecting portion that detects pressure inside the treatment vessel, and 
   the treatment state value acquiring portion acquires a state value that is a value of pressure detected by the pressure detecting portion, or a value obtained by statistically processing the value.   
     
     
         23 . The semiconductor manufacturing system according to  claim 20 ,
 wherein the semiconductor manufacturing apparatus further comprises:
 a treatment vessel in which a treatment is performed on the treatment target; and 
 a gas flow rate detecting portion that detects flow rate of gas introduced into the treatment vessel, and 
   the treatment state value acquiring portion acquires a state value that is a value of gas flow rate detected by the gas flow rate detecting portion, or a value obtained by statistically processing the value.   
     
     
         24 . An information processing method for processing a state value, which is a value relating to a state during a treatment, performed by a semiconductor manufacturing apparatus for performing a treatment on a treatment target containing a semiconductor, comprising;
 a state value receiving step of receiving the state value;   a calculating step of calculating a ratio between a value relating to a difference between the state value received in the state value receiving step and a stored standard value serving as standard for the state value, and a value relating to a difference between a stored threshold value used for judging whether or not the state value is a desired value, and the standard value; and   an output step of outputting the ratio calculated in the calculating step.   
     
     
         25 . The information processing method according to  claim 24 ,
 wherein in the state value receiving step, multiple state values in different measurement units are received,   in the calculating step, the ratio corresponding to each of the multiple state values in different measurement units is calculated, and   in the output step, the multiple ratios calculated in the calculating step are output.   
     
     
         26 . The information processing method according to  claim 24 , wherein the threshold value used in the calculating step for calculating a ratio is a value in a subrange to which the state value belongs, of a possible range of the state value that is divided into two subranges by the standard value. 
     
     
         27 . An information processing method for processing a state value, which is a value relating to a state during a treatment, performed by a semiconductor manufacturing apparatus for performing a treatment on a treatment target containing a semiconductor, comprising;
 a state value receiving step of receiving the multiple state values in different measurement units;   a calculating step of calculating, for each of the multiple state values in different measurement units, a ratio between a value relating to a difference between the state value received in the state value receiving step and a stored standard value serving as standard for the state value, and a value relating to a difference between a stored threshold value used for judging whether or not the state value is a desired value, and the standard value;   a multivariate analysis step of performing multivariate analysis, using the multiple ratios calculated in the calculating step; and   an output step of outputting a result of analysis performed in the multivariate analysis step.   
     
     
         28 . The information processing method according to  claim 27 , wherein the threshold value used in the calculating step for calculating a ratio is a value in a subrange to which the state value belongs, of a possible range of the state value that is divided into two subranges by the standard value. 
     
     
         29 . A non-transitory computer-readable storage medium having a program for causing a computer to process a state value, which is a value relating to a state during a treatment, performed by a semiconductor manufacturing apparatus for performing a treatment on a treatment target containing a semiconductor,
 wherein the program causes the computer to execute:
 a state value receiving step of receiving the state value; 
 a calculating step of calculating a ratio between a value relating to a difference between the state value received in the state value receiving step and a stored standard value serving as standard for the state value, and a value relating to a difference between a stored threshold value used for judging whether or not the state value is a desired value, and the standard value; and 
 an output step of outputting the ratio calculated in the calculating step. 
   
     
     
         30 . The non-transitory computer-readable storage medium according to  claim 29 ,
 wherein in the state value receiving step, multiple state values in different measurement units are received,   in the calculating step, the ratio corresponding to each of the multiple state values in different measurement units is calculated, and   in the output step, the multiple ratios calculated in the calculating step are output.   
     
     
         31 . The non-transitory computer-readable storage medium according to  claim 29 , wherein the threshold value used in the calculating step for calculating a ratio is a value in a subrange to which the state value belongs, of a possible range of the state value that is divided into two subranges by the standard value. 
     
     
         32 . A non-transitory computer-readable storage medium having a program for causing a computer to process a state value, which is a value relating to a state during a treatment, performed by a semiconductor manufacturing apparatus for performing a treatment on a treatment target containing a semiconductor,
 wherein the program causes the computer to execute:
 a state value receiving step of receiving the multiple state values in different measurement units; 
 a calculating step of calculating, for each of the multiple state values in different measurement units, a ratio between a value relating to a difference between the state value received in the state value receiving step and a stored standard value serving as standard for the state value, and a value relating to a difference between a stored threshold value used for judging whether or not the state value is a desired value, and the standard value; 
 a multivariate analysis step of performing multivariate analysis, using the multiple ratios calculated in the calculating step; and 
 an output step of outputting a result of analysis performed in the multivariate analysis step. 
   
     
     
         33 . The non-transitory computer-readable storage medium according to  claim 32 , wherein the threshold value used in the calculating step for calculating a ratio is a value in a subrange to which the state value belongs, of a possible range of the state value that is divided into two subranges by the standard value.