Polishing Pad and Method of Producing the Same

Abstract

The present invention mainly relates to a polishing pad and method of producing the same. The polishing pad comprises a base material having a surface for polishing a substrate, wherein the surface comprises a non-woven fabric and an elastomer. The elastomer is embedded into the fabric, and the non-woven fabric comprises a plurality of first long fibers randomly entangled with each other.

1 . A polishing pad comprising a base material having a surface for polishing a substrate, wherein the surface comprises non-woven fabric and an elastomer embedded into the non-woven fabric, and the non-woven fabric comprises a plurality of first long fibers randomly entangled with each other. 
     
     
         2 . The polishing pad according to  claim 1 , wherein the first long fiber is selected from the group consisting of a single fiber and composite fibers. 
     
     
         3 . The polishing pad according to  claim 1 , wherein the first long fiber is made of at least one material selected from the group consisting of polyamide, terephthalamide, polyester, polymethyl methacrylate, polyethylene terephthalate, polyacrylonitrile, and mixtures thereof. 
     
     
         4 . The polishing pad according to  claim 1 , wherein the length of the first long fiber is more than about 10 cm. 
     
     
         5 . The polishing pad according to  claim 1 , wherein the first long fiber is a sea-island fiber. 
     
     
         6 . The polishing pad according to  claim 1 , wherein the non-woven fabric further comprises a fiber mat comprising meshes, and the fiber mat comprises second long fibers, and the second long fibers and the first long fibers of the non-woven fabric are intertwined with each other. 
     
     
         7 . The polishing pad according to  claim 1 , wherein the elastomer is a foam resin. 
     
     
         8 . A method of polishing a substrate, the method comprising a step of using the polishing pad according to  claim 1  to polish a surface of the substrate. 
     
     
         9 . A method of producing the polishing pad according to  claim 1 , comprising steps of:
 (a) providing a base material having a surface for polishing a substrate, wherein the surface comprises non-woven fabric, and the non-woven fabric comprises a plurality of first long fibers randomly entangled with each other;   (b) impregnating the surface of the base material with an elastomer solution; and   (c) curing the elastomer impregnated in the surface of the base material.   
     
     
         10 . The method according to  claim 9 , wherein the first long fiber is selected from the group consisting of a single fiber and composite fibers. 
     
     
         11 . The method according to  claim 9 , wherein the first long fiber is made of at least one material selected from the group consisting of polyamide, terephthalamide, polyester, polymethyl methacrylate, polyethylene terephthalate, polyacrylonitrile, and mixtures thereof. 
     
     
         12 . The method according to  claim 9 , wherein a length of the first long fiber is more than about 10 cm. 
     
     
         13 . The method according to  claim 9 , wherein the first long fiber is a sea-island fiber. 
     
     
         14 . The method according to  claim 9 , wherein the non-woven fabric further comprises a fiber mat comprising meshes, and the fiber mat comprises second long fibers, and the second long fibers and the first long fibers of the non-woven fabric are intertwined with each other. 
     
     
         15 . The method according to  claim 9 , wherein the elastomer is a foam resin. 
     
     
         16 . The method according to  claim 9 , further comprising a step (c1) of washing the surface of the base material after the step (c). 
     
     
         17 . The method according to  claim 16 , further comprising a step (c2) of drying the surface of the base material after the step (c1). 
     
     
         18 . The method according to  claim 9 , further comprising a step (c3) of mechanically polishing the surface of the base material and the elastomer after the step (c).