US2010323123A1PendingUtilityA1
Paste patterns formation method and transfer film used therein
Assignee: E I DU PONT DE MENOURS AND COMPANYPriority: Nov 20, 2006Filed: Nov 19, 2007Published: Dec 23, 2010
Est. expiryNov 20, 2026(~0.3 yrs left)· nominal 20-yr term from priority
Inventors:Hideki Akimoto
H10F 77/211H05K 2203/0537H01J 2211/36H05K 2203/0568Y02E10/50H05K 3/1258H01J 9/24H01J 9/02H01J 11/44C09K 2323/00C09K 2323/055C09K 2323/05C09K 2323/02Y10T428/24802Y10T428/24479
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Claims
Abstract
Disclosed is a paste pattern formation method comprising the steps of: forming a transfer pattern material on a film base material to prepare a transfer film; sticking the transfer film on a substrate on which a transfer pattern is formed so that the transfer pattern material contacts the substrate; separating the film base material from the transfer pattern material; filling a paste into the transfer pattern depression; solidifying the paste; and removing the transfer pattern material.
Claims
exact text as granted — not AI-modified1 . A paste pattern formation method comprising the steps of:
applying a transfer pattern on a film base material, wherein said transfer pattern comprises a transfer pattern material and transfer pattern depressions, thus forming a transfer film; transferring the transfer film onto a substrate so that the transfer pattern material contacts the substrate; separating the film base material from the transfer pattern material; applying a paste into the transfer pattern depressions, resulting in a paste pattern; solidifying the paste; and removing the transfer pattern material.
2 . A paste pattern formation method comprising the steps of:
applying a transfer pattern material on a film base material; forming a transfer pattern depression(s) in the transfer pattern material, thus forming a transfer film; transferring the transfer film onto a substrate so that the transfer pattern material contacts the substrate; separating the film base material from the transfer pattern material; applying a paste into the transfer pattern depression(s), resulting in a paste pattern; solidifying the paste; and removing the transfer pattern material.
3 . The paste pattern formation method according to claim 2 , wherein the transfer pattern depression(s) are patterned with a laser.
4 . The paste pattern formation method according to claim 2 , wherein the transfer pattern depression(s) are patterned by photoetching.
5 . The paste pattern formation method according to claim 2 , wherein the transfer pattern depression(s) are patterned by press stamping.
6 . The paste pattern formation method according to claim 1 or 2 , wherein the transfer film is adhered by pressure onto the substrate onto . which the paste pattern is formed.
7 . The paste pattern formation method according to claim 1 or 2 , wherein the transfer film is adhered with an adhesive onto the substrate onto which a paste pattern is formed.
8 . The paste pattern formation method according to claim 1 or 2 , further comprising a step of, after applying the paste into the transfer pattern depression(s), removing the paste remaining on the transfer pattern material.
9 . The paste pattern formation method according to claim 1 or 2 , wherein the step of applying the paste into the transfer pattern depression(s) and the step of solidifying the paste are repeated two times or more until a predetermined paste pattern height is obtained.
10 . The paste pattern formation method according to claim 1 or 2 , wherein the transfer pattern material is removed by dissolving with water.
11 . The paste pattern formation method according to claim 10 , wherein the transfer pattern material comprises a water-soluble resin.
12 . The paste pattern formation method according to claim 1 or 2 , wherein the transfer pattern material is removed by dissolving with an organic solvent.
13 . The paste pattern formation method according to claim 1 or 2 , wherein the transfer pattern material is removed by baking.
14 . The paste pattern formation method according to claim 1 or 2 , wherein the paste pattern is an electrode pattern of a solar cell.
15 . The paste pattern formation method according to claim 1 or 2 , wherein the paste pattern is a wiring pattern of a wiring board.
16 . The paste pattern formation method according to claim 1 or 2 , wherein the paste pattern is a barrier rib of a plasma display panel.
17 . A transfer film used in the paste pattern formation method according to claim 1 , in which a transfer pattern depression is formed on a film base material.Join the waitlist — get patent alerts
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