Display device and fabricating method thereof

Abstract

A display device including a insulating substrate, an organic layer disposed on the insulating substrate, a common electrode disposed on the organic layer and a bead layer including a plurality of beads through which light from the organic layer passes. A method of fabricating a display device, the method including forming an organic film on a insulating substrate, forming a first transparent electrode layer on the organic film and forming a bead layer including a plurality of beads on the first transparent electrode layer.

1 . A display device comprising
 an insulating substrate;   an organic layer disposed on the insulating substrate; and   a common electrode disposed on the organic layer,   wherein the common electrode comprises at least one of silver and magnesium.   
     
     
         2 . The display device according to  claim 1 , wherein the common electrode has a thickness of about 50 nanometers (nm) to about 200 nanometers (nm). 
     
     
         3 . The display device according to  claim 2 , further comprising a bead layer disposed on the common electrode, the bead layer comprising a plurality of beads. 
     
     
         4 . The display device according to  claim 1 , further comprising a bead layer disposed on the common electrode, the bead layer comprising a plurality of beads. 
     
     
         5 . The display device according to  claim 1 , wherein the common electrode comprises a first layer and a second layer that is disposed on the first layer. 
     
     
         6 . The display device according to  claim 5 , wherein the first layer comprises the least one of silver and magnesium. 
     
     
         7 . The display device according to  claim 6 , wherein the first layer has a thickness of about 50 nanometers (nm) to about 200 nanometers (nm). 
     
     
         8 . The display device according to  claim 7 , wherein the second layer comprises indium tin oxide (“ITO”) or indium zinc oxide (“IZO”). 
     
     
         9 . The display device according to  claim 8 , wherein the second layer has a thickness of about 0.03 micrometers (μm) to about 1.5 micrometers (μm). 
     
     
         10 . The display device according to  claim 9 , further comprising a bead layer disposed on the second layer, the bead layer comprising a plurality of beads. 
     
     
         11 . The display device according to  claim 9 , further comprising a bead layer interposed between the first layer and the second layer, the bead layer comprising a plurality of beads. 
     
     
         12 . The display device according to  claim 5 , wherein the first layer has a thickness of about 50 nanometers (nm) to about 200 nanometers (nm). 
     
     
         13 . The display device according to  claim 12 , wherein the second layer comprises indium tin oxide (“ITO”) or indium zinc oxide (“IZO”). 
     
     
         14 . The display device according to  claim 13 , wherein the second layer has a thickness of about 0.03 micrometers (μm) to about 1.5 micrometers (μm). 
     
     
         15 . The display device according to  claim 14 , further comprising a bead layer disposed on the second layer, the bead layer comprising a plurality of beads. 
     
     
         16 . The display device according to  claim 14 , further comprising a bead layer interposed between the first layer and the second layer, the bead layer comprising a plurality of beads. 
     
     
         17 . The display device according to  claim 5 , wherein the second layer comprises indium tin oxide (“ITO”) or indium zinc oxide (“IZO”). 
     
     
         18 . The display device according to  claim 17 , wherein the second layer has a thickness of about 0.03 micrometers (μm) to about 1.5 micrometers (μm). 
     
     
         19 . The display device according to  claim 5 , wherein the second layer has a thickness of about 0.03 micrometers (μm) to about 1.5 micrometers (μm).