US2010301006A1PendingUtilityA1

Method of Manufacturing an Electrical Component on a Substrate

Assignee: NILSSON PETER L JPriority: May 29, 2009Filed: May 29, 2009Published: Dec 2, 2010
Est. expiryMay 29, 2029(~2.8 yrs left)· nominal 20-yr term from priority
Inventors:Peter Nilsson
H05K 2203/058H05K 2203/0571C23F 1/02H05K 2203/072H05K 3/28H05K 3/061H05K 1/0393H05K 3/0052H05K 3/243H05K 1/165
49
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Claims

Abstract

Electrical components, e.g., a radiator for a cell phone circuit, are manufactured by a method comprising the steps of: (A) providing a substrate, e.g., a polymeric film, having a first facial side that has a metal coating, e.g., copper, and a second facial side that does not have a metal coating; (B) applying a covering material that is impervious to etching and plating, e.g., solder-mask, to the metal coating to define a trace except for its contact spot; (C) applying etch-resist to the metal coating to define the contact spot; (D) etching the metal coating from the substrate that is not covered by the covering material or etch-resist; (E) removing the etch-resist from the metal coating; and (F) plating the uncovered metal coating with a plating material comprising at least one of silver, gold, and nickel.

Claims

exact text as granted — not AI-modified
1 . A method of manufacturing an electrical component that comprises a trace that comprises a contact spot, the method comprising the steps of:
 A. Providing a substrate having a first facial side that has a metal coating and a second facial side that does not have a metal coating;   B. Applying a covering material that is impervious to etching and plating to the metal coating to define the trace of the electrical component except for the contact spot;   C. Applying etch-resist to the metal coating to define the contact spot of the trace;   D. Etching from the substrate the metal coating not covered by the covering material or etch-resist;   E. Removing the etch-resist from the metal coating; and   F. Plating the uncovered metal coating with a plating material comprising at least one of silver, gold and nickel.   
     
     
         2 . The method of  claim 1  in which the plating is electroless plating. 
     
     
         3 . The method of  claim 2  in which the electroless plating is autocatalytic electroless silver plating. 
     
     
         4 . The method of  claim 2  in which the covering material and etch-resist is applied to the metal coating by at least one of screen printing and photo-etching. 
     
     
         5 . The method of  claim 4  comprising the further step of applying an adhesive to the second side of the substrate. 
     
     
         6 . The method of  claim 5  comprising the further step of cutting at least the substrate with a laser after the uncovered metal coating is plated. 
     
     
         7 . The method of  claim 6  in which the covering material is applied to the metal coating of the substrate to define a plurality of traces arrayed in a matrix comprising at least two rows. 
     
     
         8 . The method of  claim 7  in which the substrate is cut into strips with each strip including at least one electrical component. 
     
     
         9 . The method of  claim 7  in which the substrate is flexible. 
     
     
         10 . The method of  claim 9  in which the electrical component is a radiator. 
     
     
         11 . The method of  claim 10  in which the substrate is a polymeric film. 
     
     
         12 . The method of  claim 11  in which the substrate is a polyethylene terephthalate film, the metal coating is copper, and the plating material is applied in a substantially uniform thickness to the uncovered metal coating. 
     
     
         13 . The method of  claim 12  in which the film has a thickness of 40 to 60 microns, the metal coating has a thickness of 10 to 30 microns, and the thickness of the plated material is at least 0.1 micron. 
     
     
         14 . The method of  claim 13  in which the adhesive is a double-sided tape. 
     
     
         15 . The method of  claim 14  in which the cutting of the film with a laser includes cutting holes through the film and substrate. 
     
     
         16 . The method of  claim 15  in which the thickness of the plated material is 0.2 to 3 microns. 
     
     
         17 . The method of  claim 2  in which the substrate is rigid. 
     
     
         18 . A method of manufacturing radiators on a polymeric film, the radiators comprising a trace that comprises a contact spot, the method comprising the steps of:
 A. Providing a flexible, polymeric film having a first facial side that has a copper metal coating and a second facial side that does not have a metal coating;   B. Applying a solder-mask to the copper metal coating to define a plurality of discreet radiator traces, each trace without a contact spot, the radiator traces arrayed in a matrix comprising at least two rows;   C. Applying etch-resist to the copper metal coating to define the contact spot of each radiator trace;   D. Etching from the film the metal coating not covered by the solder-mask or etch-resist;   E. Removing the etch-resist from the copper metal coating;   F. Electrolessly plating the uncovered copper metal coating of the contact spot with a substantially uniform thickness of plating material that comprises at least one of silver, gold and nickel;   G. Applying a double-sided tape to the second facial side of the polymeric film; and   H. Cutting the polymeric film and double-sided tape to form strips each of which includes at least one row of radiators.   
     
     
         19 . The method of  claim 18  in which the polymeric film is a polyethylene terephthalate film that has a thickness of 40 to 60 microns, the copper metal coating has a thickness of 10 to 30 microns, and the thickness of the plated material is not greater than 2 microns. 
     
     
         20 . The method of  claim 19  in which the plating material comprises silver.

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