Vaporizing unit, film forming apparatus, film forming method, computer program and storage medium

Abstract

A vaporizing unit, in supplying a gas material produced by vaporizing a liquid material onto a substrate to conduct a film forming process, can vaporize the liquid material with high efficiency to suppress generation of particles. With the vaporizing unit, positively or negatively charged bubbles, which have a diameter of 1000 nm or less, are produced in the liquid material, and the liquid material is atomized to form a mist of the liquid material. Further, the mist of the liquid material is heated and vaporized. The fine bubbles are uniformly dispersed in advance in the liquid material, so that very fine and uniform mist particles of the liquid material are produced when the liquid material is atomized, which makes heat exchange readily conducted. By vaporizing the mist of the liquid material, vaporization efficiency is enhanced, and generation of particles can be suppressed.

1 . A vaporizing unit comprising:
 a bubble generation device for generating bubbles having a diameter of 1000 nm or less and charged positively or negatively in a liquid material for film formation by supplying a carrier gas for bubble generation into the liquid material;   a vaporizer, connected to the bubble generation device, for vaporizing the liquid material to obtain a gas material; and   a gas material outlet port, provided at the vaporizer, for discharging the gas material obtained by vaporization of the liquid material in the vaporizer,   wherein the vaporizer includes a vaporization chamber for vaporizing the liquid material, an atomization part, provided at an inlet of the vaporization chamber, for atomizing the liquid material containing the bubbles supplied from the bubble generation device to produce a mist of the liquid material and supply the mist into the vaporization chamber, and a heater provided in the vaporization chamber to heat and vaporize the mist of the liquid material supplied from the atomization part into the vaporization chamber.   
     
     
         2 . The vaporizing unit of  claim 1 , wherein the bubble generation device generates the bubbles by forming a revolving flow of the carrier gas. 
     
     
         3 . The vaporizing unit of  claim 1 , wherein the atomization part is configured as a nozzle for discharging the liquid material containing the bubbles together with a carrier gas for atomization. 
     
     
         4 . A film forming apparatus comprising:
 a vaporizing unit for generating a gas material; and   a film forming unit including a processing chamber connected to the vaporizing unit, a target object being loaded in the processing chamber and the film forming unit performing a film forming process on the target object by using the gas material supplied from the vaporizing unit,   wherein the vaporizing unit includes:
 a bubble generation device for generating bubbles having a diameter of 1000 nm or less and charged positively or negatively in a liquid material for film formation by supplying a carrier gas for bubble generation into the liquid material; 
 a vaporizer, connected to the bubble generation device, for vaporizing the liquid material to obtain the gas material; and 
 a gas material outlet port, provided at the vaporizer, for discharging the gas material obtained by vaporization of the liquid material in the vaporizer, 
 wherein the vaporizer includes a vaporization chamber for vaporizing the liquid material, an atomization part, provided at an inlet of the vaporization chamber, for atomizing the liquid material containing the bubbles supplied from the bubble generation device to produce a mist of the liquid material and supply the mist into the vaporization chamber, and a heater provided in the vaporization chamber to heat and vaporize the mist of the liquid material supplied from the atomization part into the vaporization chamber. 
   
     
     
         5 . A film forming method comprising:
 generating bubbles having a diameter of 1000 nm or less and charged positively or negatively in a liquid material for film formation by supplying a carrier gas for bubble generation into the liquid material;   producing a mist of the liquid material by atomizing the liquid material containing the bubbles;   obtaining a gas material by heating and vaporizing the mist of the liquid material; and   performing a film forming process on a target object in a processing chamber by supplying the gas material to the target object.   
     
     
         6 . The vaporizing method of  claim 5 , wherein said generating bubbles includes forming a revolving flow of the carrier gas. 
     
     
         7 . The vaporizing method of  claim 5 , wherein said producing a mist of the liquid material includes atomizing the liquid material containing the bubbles and a carrier gas for atomization through a nozzle. 
     
     
         8 . (canceled) 
     
     
         9 . (canceled) 
     
     
         10 . The vaporizing unit of  claim 2 , wherein the atomization part is configured as a nozzle for discharging the liquid material containing the bubbles together with a carrier gas for atomization. 
     
     
         11 . The vaporizing method of  claim 6 , wherein said producing a mist of the liquid material includes atomizing the liquid material containing the bubbles and a carrier gas for atomization through a nozzle.