Cleaning compositions and methods for using same

Abstract

The present invention relates to cleaning compositions and to methods of using the cleaning compositions for cleaning of various substrates and to processes for making such cleaning compositions.

1 . A cleaning composition comprising: (a) a glycol ether in an amount of at least about 95%, by weight and (b) a phosphate ester-containing compound in an amount of about 0.01% to about 4%, by weight. 
     
     
         2 . The composition of  claim 1  wherein the glycol ether (a) has a flash point of greater than about 100° F., (b) is soluble in carbon dioxide at a pressure of between about 600 and about 1050 pounds per square inch and at a temperature of between about 5° C. and about 30° C.; and (c) has a specific gravity greater than about 0.7; 
     
     
         3 . The composition of  claim 1  wherein the glycol ether has Hansen solubility parameters of about 7.2-8.1 (cal/cm 3 ) 1/2  for dispersion, about 2.0-4.8 (cal/cm 3 ) 1/2  for polar, and about 4.0-7.3 (cal/cm 3 ) 1/2  for hydrogen bonding. 
     
     
         4 . The composition of  claim 2  wherein the glycol ether is of formula: 
       
         
           
           
               
               
           
         
         wherein x, y and z each is zero or one and at least one of x, y and z is one; 
         R″ is a C 1-10  linear or branched alkyl; 
         R 1-12 , if present, are independently C m H n F p  where m is an integer between zero and two, inclusive, and n and p are integers between zero and five, inclusive; and 
         R′ is O, S, carbonyl or ester. 
       
     
     
         5 . The composition of  claim 1  wherein the glycol ether comprises one or more of dipropylene glycol n-butyl ether, ethylene glycol ethyl ether, diethylene glycol butyl ether, propylene glycol t-butyl ether, dipropylene glycol methyl ether, tripopylene glycol methyl ether, dipropylene glycol n-propyl ether or tripropylene glycol n-butyl ether. 
     
     
         6 . The composition of  claim 1  wherein the phosphate ester-containing compound comprises: octylphenol phosphate ester, nonylphenol phosphate ester, isodecyl alcohol phosphate ester, linear or branched alcohol C 8 -C 10  phosphate ester. 
     
     
         7 . The composition of  claim 6  wherein the phosphate ester-containing compound is ethoxylated. 
     
     
         8 . The composition of  claim 7  wherein the phosphate ester-containing compound comprises on average about 4 to about 10 moles of ethoxyl groups. 
     
     
         9 . The composition of  claim 1  further comprising a neutralizing agent. 
     
     
         10 . The composition of  claim 9  wherein the neutralizing agent comprises an amine compound or a salt of a Group Ia, IIa or transition metal. 
     
     
         11 . The composition of  claim 7  wherein the neutralizing agent comprises a salt of a Group Ia, IIa or transition metal is selected from sodium bicarbonate, sodium carbonate, potassium carbonate, potassium bicarbonate, potassium hydroxide, sodium citrate, sodium hydroxide, sodium phosphate, sodium polyphosphate, sodium pyrophosphate, sodium sesquicarbonate, sodium acetate, sodium tripolyphosphate, tetrapotassium pyrophosphate, tetrasodium pyrophosphate, tripotassium phosphate, and trisodium phosphate, magnesium hydroxide, calcium carbonate, calcium phosphate, calcium hydroxide, calcium bicarbonate, calcium citrate, calcium borate, magnesium hydroxide, magnesium, metasilicate aluminate, magnesium oxide and zinc hydroxide. 
     
     
         12 . The composition of  claim 1  further comprising water. 
     
     
         13 . The composition of  claim 8  further comprising one or more additives selected from an antistatic agent, a sizing agent, a bleach and an optical whitener. 
     
     
         14 . A cleaning composition comprising: (a) a glycol ether in an amount of at least about 95%, by weight, (b) a phosphate ester-containing compound in an amount of about 0.01% to about 2%, by weight, and (c) a neutralizing agent. 
     
     
         15 . A cleaning composition comprising: (a) dipropylene glycol n-butyl ether in an amount of at least about 95%, by weight, (b) a phosphate ester-containing compound selected from octylphenol phosphate ester, nonylphenol phosphate ester, isodecyl alcohol phosphate ester, linear or branched alcohol C 8 -C 10  phosphate ester in an amount of about 0.01% to about 2%, by weight, a neutralizing agent and water. 
     
     
         16 . The cleaning composition of  claim 15  wherein the phosphate ester-containing compound comprises about 4 to about 10 moles of ethoxyl groups. 
     
     
         17 . A process for making a cleaning composition, the process comprising the steps of:
 admixing, in any order, a glycol ether, a phosphate ester-containing compound and a neutralzing agent to form a base detergent formulation; and   combining, in any order, the base detergent formulation with a glycol ether and optionally with an antistatic agent, a sizing agent, a bleach or an optical whitener to foim the cleaning composition.   
     
     
         18 . The process of  claim 17  further comprising adding water during the admixing and/or combining steps. 
     
     
         19 . A process for cleaning a substrate comprising:
 placing the substrate to be cleaned in a non-pressurizable cleaning vessel;   adding the cleaning composition of  claim 1  to the cleaning vessel;   cleaning the substrate in presence of the cleaning composition and in absence of pressurized fluid solvent;   removing a portion of the cleaning composition from the cleaning vessel;   placing the substrates in a pressurizable drying vessel and pressurizing the drying vessel;   adding pressurized fluid solvent to the drying vessel;   removing at least a portion of the pressurized fluid solvent from the drying vessel;   and removing the substrates from the drying vessel, wherein the process removes water soluble and water insoluble contaminants from the substrates..   
     
     
         20 . A process for cleaning substrates comprising:
 placing the substrates to be cleaned in a pressurizable vessel wherein the vessel is not pressurized;   adding the cleaning composition of  claim 1  to the vessel;   cleaning the substrates in presence of the cleaning composition;   removing a portion of the cleaning composition from the vessel;   pressurizing the vessel and adding pressurized fluid solvent to the vessel;   removing at least a portion of the pressurized fluid solvent from the vessel;   and removing the substrates from the vessel, wherein the process removes water soluble and water insoluble contaminants from the substrates.