Supporting plate, stage device, exposure apparatus, and exposure method

Abstract

An exposure apparatus and method exposes, using an optical member, a pattern of a mask onto a substrate that is located on a substrate stage which is movable over a supporting plate. A liquid is provided between the optical member and the substrate, Fluid is sprayed toward the supporting plate to remove liquid from the supporting plate.

1 . An exposure method which exposes, using an optical member, a pattern of a mask onto a substrate that is located on a substrate stage which is movable over a supporting plate, the method comprising the steps of:
 providing liquid between the optical member and the substrate; and   spraying a fluid toward the supporting plate to remove liquid from the supporting plate.   
     
     
         2 . The exposure method of  claim 1 , wherein the fluid is a gas. 
     
     
         3 . The exposure method of  claim 2 , wherein the gas is air. 
     
     
         4 . The exposure method of  claim 1 , wherein the spraying includes spraying the fluid from a plurality of spray ports. 
     
     
         5 . The exposure method of  claim 4 , wherein the plurality of spray ports spray the fluid in different directions. 
     
     
         6 . The exposure method of  claim 1 , wherein the spraying includes spraying the fluid diagonally downward toward the supporting plate. 
     
     
         7 . The exposure method of  claim 1 , further comprising collecting the liquid removed from the supporting plate. 
     
     
         8 . The exposure method of  claim 1 , further comprising collecting the liquid disposed on the substrate from above the substrate. 
     
     
         9 . An exposure method for exposing a substrate by irradiating exposure light onto the substrate through a liquid, the method comprising:
 holding the substrate on a substrate stage which is movable over a supporting plate;   providing liquid to a space between an optical member and the substrate which is held by the substrate stage;   collecting liquid on the substrate which is held by the substrate stage; and   spraying a fluid toward the supporting plate to remove liquid from the supporting plate.   
     
     
         10 . The exposure method of  claim 9 , wherein the fluid is a gas. 
     
     
         11 . The exposure method of  claim 10 , wherein the gas is air. 
     
     
         12 . The exposure method of  claim 9 , wherein the spraying includes spraying the fluid from a plurality of spray ports. 
     
     
         13 . The exposure method of  claim 12 , wherein the plurality of spray ports spray the fluid in different directions. 
     
     
         14 . The exposure method of  claim 9 , wherein the spraying includes spraying the fluid diagonally downward toward the supporting plate. 
     
     
         15 . The exposure method of  claim 9 , further comprising collecting the liquid removed from the supporting plate. 
     
     
         16 . The exposure method of  claim 9 , wherein the collecting liquid on the substrate includes collecting the liquid from above the substrate. 
     
     
         17 . An exposure apparatus which exposes a pattern onto a substrate, the exposure apparatus comprising:
 a supporting plate having a surface;   a substrate stage which holds the substrate and is movable over the supporting plate;   a liquid supply device having a supply nozzle which supplies liquid to the substrate; and   a spraying device that sprays a fluid toward the supporting plate to remove liquid from the supporting plate.   
     
     
         18 . The exposure apparatus of  claim 17 , wherein the fluid sprayed by the spaying device is a gas. 
     
     
         19 . The exposure apparatus of  claim 17 , wherein the spraying device includes a plurality of spray ports. 
     
     
         20 . The exposure apparatus of  claim 19 , wherein the plurality of spray ports spray the fluid in different directions. 
     
     
         21 . The exposure apparatus of  claim 17 , wherein the spraying device sprays the fluid diagonally downward toward the supporting plate. 
     
     
         22 . The exposure apparatus of  claim 17 , further comprising a collection device that collects the liquid removed from the supporting plate. 
     
     
         23 . The exposure apparatus of  claim 17 , further comprising a collection device that collects the liquid disposed on the substrate from above the substrate. 
     
     
         24 . The exposure apparatus of  claim 17 , further comprising:
 a first collection device that collects the liquid disposed on the substrate from above the substrate; and   a second collection device that collects the liquid removed from the supporting plate.   
     
     
         25 . An exposure apparatus which exposes a pattern onto a substrate, the exposure apparatus comprising:
 a supporting plate;   a substrate stage which holds the substrate and is movable over the supporting plate;   a bearing device which is arranged in a space between the supporting plate and the substrate stage, and has a first outflow device which sprays a fluid and an intake device which absorbs a fluid; and   a second outflow device which sprays a fluid to remove liquid from the supporting plate.