Method of Concurrently Patterning a Substrate Having a Plurality of Fields and a Plurality of Alignment Marks

Abstract

Imprint lithography templates for patterning substrates are described. The templates include a section having a mold a first pattern of alignment forming areas and template alignment marks. The additional sections are generally devoid of a mold. One or more of the additional section may include the first pattern of a second pattern of alignment forming areas and template alignment marks. The second pattern may correspond to the first pattern.

1 . A nano imprint lithography template, comprising:
 a plurality of sections including:
 a first section having a mold and a first subset of alignment forming areas and a plurality of template alignment marks defining a first pattern; and 
 a second section having a second subset of alignment forming areas and a plurality of template alignment marks defining a second pattern; 
 wherein the first pattern corresponds to the second pattern. 
   
     
     
         2 . The nano imprint lithography template of  claim 1 , wherein the second section is devoid of a mold. 
     
     
         3 . The nano imprint lithography template of  claim 1 , wherein the alignment forming areas are checkerboard forming alignment marks and the template alignment marks are grating alignment marks. 
     
     
         4 . The template of  claim 1 , wherein the alignment forming areas are checkerboard forming alignment marks and the template alignment marks are substantially planar. 
     
     
         5 . A nano imprint lithography template, comprising:
 a first section having a first dimension of a length and a width, the first section having a mold with a relief pattern; and,   a second section having second dimensions of a length and a width, the second section devoid of a mold, wherein the first dimensions are substantially similar to the second dimensions.   
     
     
         6 . The nano imprint lithography template of  claim 5 , further comprising a first pattern of alignment forming areas and template alignment marks positioned adjacent to the first section. 
     
     
         7 . The nano imprint lithography template of  claim 6 , further comprising a second pattern of alignment forming areas and template alignment marks positioned adjacent to the second section, wherein the first pattern is different from the second pattern. 
     
     
         8 . A nano imprint lithography template, comprising:
 a plurality of sections, each section having substantially similar dimensions of length and width, with only one of the plurality of sections having a mold, the mold having a relief pattern defined therein.   
     
     
         9 . The template of  claim 8 , further comprising a plurality of alignment forming areas and template alignment marks. 
     
     
         10 . The template of  claim 9 , wherein each section is separated from each adjacent section by a street and each section is separated from the perimeter of the template by a street and the plurality of alignment forming areas and template alignment marks are positioned within the streets. 
     
     
         11 . The template of  claim 10 , wherein the alignment forming areas are checkerboard forming alignment marks and the template alignment marks are grating alignment marks. 
     
     
         12 . The template of  claim 10 , wherein the alignment forming areas are checkerboard forming alignment marks and the template alignment marks are substantially planar. 
     
     
         13 . The template of  claim 8 , further comprising a first subset of alignment forming areas and a first subset of template alignment marks defining a first pattern positioned adjacent to the mold. 
     
     
         14 . The template of  claim 13 , further comprising a second subset of alignment forming areas and a second subset of template alignment marks defining a second pattern, wherein the second pattern corresponds to the first pattern.