Nanostructured thin-film formed by utilizing oblique-angle deposition and method of the same

Abstract

The present invention discloses a transparent conductive nanostructured thin-film by oblique-angle deposition and method of the same. An electron beam system is utilized to evaporate the target source. Evaporation substrate is disposed on a plurality of adjustable sample stage. Multiple gas control valve and heat source is provided to control the gas flow and temperature within the process chamber. An annealing process is performed after the evaporation to improve the thin-film structure and optoelectronic properties.

1 . A film formed by electron bean oblique-angle deposition, wherein said film comprises porous nanorods with narrow end to form a single layer structure with graded refractive index and better transmissivity. 
     
     
         2 . The film of  claim 1 , wherein said target source comprises indium tin oxide (ITO), aluminum zinc oxide (AZO), or ZnO. 
     
     
         3 . The film of  claim 1 , wherein said evaporation substrate comprises Si substrate, GaAs substrate, glass substrate, or flexible substrate.