Lithography systems and methods

Abstract

A method of generating an imaging pattern using a mask having a mathematical (e.g., Fourier-space) representation of an imaging pattern in an imaging plane. In addition to the foregoing, other method aspects are described in the claims, drawings, and text forming a part of the present application. Other methods and apparatuses are also disclosed.

1 . A method of generating an imaging pattern at an image plane comprising:
 orienting a mask having a mask pattern configured to pass light to provide a spatial frequency domain representation of of the imaging pattern;   diffracting light with the mask; and   transforming the diffracted light with an optic interposed between the mask and the image plane to provide the imaging pattern at the image plane.   
   
   
       2 . The method of  claim 1  wherein diffracting light with the mask comprises diffracting laser light with the mask. 
   
   
       3 . The method of  claim 1  wherein the image plane comprises a photoresist on an integrated circuit substrate. 
   
   
       4 . The method of  claim 1  wherein the substantially coherent light source includes a light having a wavelength of greater than about 148 nanometers and less than about 1000 nanometers. 
   
   
       5 . The method of  claim 1  wherein the substantially coherent light source includes a light having a wavelength of greater than about 1/10 (0.10) nanometers and less than about 148 nanometers. 
   
   
       6 . The method of  claim 1  wherein the substantially coherent light source includes a light having a wavelength of greater than about 1/10 (0.10) nanometers and less than about 10 nanometers. 
   
   
       7 . The method of  claim 1  wherein the substantially coherent light source includes a light having a non-zero wavelength. 
   
   
       8 . The method of  claim 1  wherein the substantially coherent light source includes a monochromator. 
   
   
       9 . The method of  claim 8  wherein the monochromator includes at least one of a diffraction grating or a prism. 
   
   
       10 . The method of  claim 8  wherein the monochromator is a device selected from a group including but not limited to a diffraction grating or a prism. 
   
   
       11 . The method of  claim 1  wherein the imaging pattern includes a plurality of diffraction particles. 
   
   
       12 . The method of  claim 11  wherein the plurality of diffraction particles includes diffraction particles having nanometer scale sizes. 
   
   
       13 . The method of  claim 1  wherein the mask includes at least one crystal having the mask pattern fabricated thereon. 
   
   
       14 . The method of  claim 1  wherein a surface of the mask substantially parallels a surface of the chip. 
   
   
       15 . The method of  claim 1  wherein the substantially coherent light source includes light having an s-polarization. 
   
   
       16 . The method of  claim 1  wherein the photoresist is substantially coincident with the imaging plane. 
   
   
       17 . An apparatus for generating an imaging pattern at an image plane comprising:
 mask means having a mask pattern configured to pass light to provide a spatial frequency domain representation of the imaging pattern;   light means for providing imaging light onto the mask means; and   diffractive means interposed between the mask means and the image plane and configured to diffract the imaging light transmitted by the mask means, wherein the imaging light transmitted by the mask means forms the imaging pattern at the image plane.   
   
   
       18 . An apparatus for generating an imaging pattern at an image plane comprising:
 a light source configured to emit imaging light;   a mask structure positioned to intercept at least a portion of the emitted imaging light, the mask structure including a light mask patterned to pass light according to a spatial frequency domain representation of the imaging pattern; and   a transforming optic interposed between the light mask and the image plane and being arranged to process the passed light in a manner that produces the imaging pattern at the image plane.   
   
   
       19 . The apparatus of  claim 18  wherein the substantially coherent light source includes at least one of a laser or a free electron laser. 
   
   
       20 . The apparatus of  claim 18  wherein the spatial frequency domain representation includes a spatial Fourier transform representation. 
   
   
       21 . The apparatus of  claim 18  wherein the substantially coherent light source includes a light having a wavelength of greater than about 148 nanometers and less than about 1000 nanometers. 
   
   
       22 . The apparatus of  claim 18  wherein the substantially coherent light source includes a light having a wavelength of greater than about 1/10 (0.10) nanometers and less than about 148 nanometers. 
   
   
       23 . The apparatus of  claim 18  wherein the substantially coherent light source includes a light having a wavelength of greater than about 1/10 (0.10) nanometers and less than about 10 nanometers. 
   
   
       24 . The apparatus of  claim 18  wherein the transforming optic arranged to process the passed light in a manner that produces the imaging pattern at the image plane includes:
 a transforming optic arranged to process the passed light, including implementing a spatial Fourier transform, in a manner that produces the imaging pattern at the image plane.   
   
   
       25 . The apparatus of  claim 18  wherein the substantially coherent light source includes a monochromator. 
   
   
       26 . The apparatus of  claim 25  wherein the monochromator includes at least one of a diffraction grating or a prism. 
   
   
       27 . The apparatus of  claim 18  wherein the transforming optic arranged to process the passed light in a manner that produces the imaging pattern at the image plane includes:
 a transforming optic arranged to process the passed light, including transforming with a lens positioned to produce a Fourier transform of the passed light, in a manner that produces the imaging pattern at the image plane.   
   
   
       28 . The apparatus of  claim 18  wherein the imaging pattern includes a plurality of diffraction particles. 
   
   
       29 . The apparatus of  claim 28  wherein the plurality of diffraction particles includes diffraction particles having sizes within nanometer ranges. 
   
   
       30 . The apparatus of  claim 18  wherein the mask includes at least one crystal having the imaging pattern fabricated thereon. 
   
   
       31 . The apparatus of  claim 18  wherein a surface of the mask substantially parallels the surface of the chip. 
   
   
       32 . The apparatus of  claim 18  wherein the substantially coherent light source emits substantially coherent light source having an s-polarization. 
   
   
       33 . The apparatus of  claim 18  wherein the photoresist substantially coincides with the imaging plane. 
   
   
       34 . (canceled) 
   
   
       35 . (canceled) 
   
   
       36 . (canceled) 
   
   
       37 . (canceled) 
   
   
       38 . A method, comprising:
 orienting a mask having a mask pattern configured to pass light to provide a spatial frequency domain representation of an imaging pattern in an imaging plane between a substantially coherent light source and the integrated circuit substrate;   diffracting light with the mask;   interposing a transforming optic between the mask and the image plane; and   transmitting the diffracted light through the transforming optic to provide the imaging pattern at the image plane.   
   
   
       39 . An apparatus for generating an imaging pattern on a chip comprising:
 mask means having a mask pattern configured to pass light to provide a spatial frequency domain representation of the imaging pattern;   light means for exposing the mask means with a substantially coherent light; and   optical means for processing a passed light from the mask means to provide a diffracted light that forms the imaging pattern on a photoresist.   
   
   
       40 . (canceled)