US2010224112A1PendingUtilityA1
Automatic sizing of embroidery
Est. expiryMar 5, 2029(~2.6 yrs left)· nominal 20-yr term from priority
Inventors:Jerome Kahn
D05B 35/12D05C 13/02
20
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Claims
Abstract
A stitch pattern for a word or other design is created using known methods of forming a stitch pattern for the word to be stitched. The horizontal and vertical dimensions of the stitch pattern are then compared to the dimensions of the sewing area. This comparison is expressed as a ratio which may be used to adjust the size of the stitch pattern to optimally fit the sewing area. The ratio may be applied to individual stitch patterns for letter characters that are combined to form a word or may be applied to a stitch pattern for an entire word or design.
Claims
exact text as granted — not AI-modified1 . A method for producing at least one stitch pattern having an optimal size comprising:
(a) measuring a width of an initial stitch pattern; (b) measuring a height of the initial stitch pattern; (c) calculating a horizontal adjustment ratio by dividing a width of a rectangular safe zone by the width of the initial stitch pattern; (d) calculating a vertical adjustment ratio by dividing a height of the rectangular safe zone by the height of the initial stitch pattern; (e) multiplying the initial image by the lesser of the horizontal adjustment ratio and the vertical adjustment ratio to produce an adjusted image; and, (f) processing the adjusted image into a final stitch pattern.
2 . The method for producing at least one stitch pattern having an optimal size of claim 1 wherein the rectangular safe zone is the rectangular sewing area.
3 . The method for producing at least one stitch pattern having an optimal size of claim 1 wherein the rectangular safe zone is inside a guard area of a sewing area and the width of the rectangular safe zone is equal to a width of a rectangular sewing area minus twice a width of the guard area and the height of the rectangular safe zone is equal to a height of the rectangular sewing area minus twice the height of the guard area.
4 . The method for producing at least one stitch pattern having an optimal size of claim 1 further comprising the step of processing an image for use in automated embroidery into an initial stitch pattern prior to the measuring of the width of the initial stitch pattern.
5 . The method for producing at least one stitch pattern having an optimal size of claim 1 wherein in the at least one image comprises a plurality of images and further comprising repeating steps (a) through (f) for each of the plurality of images.
6 . The method for producing at least one stitch pattern having an optimal size of claim 1 wherein steps (a) through (f) are performed by computer processing means compatible with existing computer processing means for use with automated embroidery machines.
7 . A method for producing at least one stitch pattern having an optimal size for embroidering in a rectangular sewing area comprising:
(a) creating an initial stitch pattern comprised of a sequence of initial character stitch patterns, wherein the initial character stitch patterns are provided by an character stitch pattern database; (b) measuring a width of the initial stitch pattern; (c) measuring a height of the initial stitch pattern; (d) calculating a horizontal adjustment ratio by dividing a width of a rectangular safe zone by the width of the initial stitch pattern; (e) calculating a vertical adjustment ratio by dividing a height of the rectangular safe zone by the height of the initial stitch pattern; (f) multiplying the initial character stitch patterns by the lesser of the horizontal adjustment ratio and the vertical adjustment ratio to produce adjusted character stitch patterns; and, (g) converting the sequence of characters into an adjusted stitch pattern comprised of a sequence of the adjusted character stitch patterns.
8 . The method for producing at least one stitch pattern having an optimal size of claim 7 wherein the rectangular safe zone is the rectangular sewing area.
9 . The method for producing at least one stitch pattern having an optimal size of claim 7 wherein the rectangular safe zone is inside a guard area of a sewing area and the width of the rectangular safe zone is equal to a width of a rectangular sewing area minus twice a width of the guard area and the height of the rectangular safe zone is equal to a height of the rectangular sewing area minus twice the height of the guard area.
10 . The method for producing at least one stitch pattern having an optimal size of claim 7 wherein in the at least one image comprises a plurality of images and further comprising repeating steps (a) through (g) for each of the plurality of images.
11 . The method for producing at least one stitch pattern having an optimal size of claim 7 wherein steps (a) through (g) are performed by computer processing means compatible with existing computer processing means for use with automated embroidery machines.
12 . The method for producing at least one stitch pattern having an optimal size of claim 7 wherein the sequence of characters is a vertically linear sequence.
13 . The method for producing at least one stitch pattern having an optimal size of claim 12 wherein the sequence of characters is a series of columns of vertically linear sequences.
14 . The method for producing at least one stitch pattern having an optimal size of claim 7 wherein the sequence of characters is a horizontally linear sequence.
15 . The method for producing at least one stitch pattern having an optimal size of claim 14 wherein the sequence of characters is a series of rows of horizontally linear sequences.
16 . The method for producing at least one stitch pattern having an optimal size of claim 7 wherein steps (a) through (f) are performed by computer processing means compatible with existing computer processing means for use with automated embroidery machines.
17 . A method for producing a plurality of stitch patterns having optimal size comprising:
(a) measuring a width of an initial stitch pattern; (b) measuring a height of the initial stitch pattern; (c) calculating a horizontal adjustment ratio by dividing a width of a rectangular safe zone by the width of the initial stitch pattern, wherein the rectangular safe zone is inside a guard area of a sewing area and the width of the rectangular safe zone is equal to a width of a rectangular sewing area minus twice a width of the guard area; (d) calculating a vertical adjustment ratio by dividing a height of the rectangular safe zone by the height of the initial stitch pattern wherein the rectangular safe zone is inside a guard area of the sewing area and the height of the rectangular safe zone is equal to a height of the rectangular sewing area minus twice the height of the guard area; (e) multiplying the initial image by the lesser of the horizontal adjustment ratio and the vertical adjustment ratio to produce an adjusted image; (f) processing the adjusted image into a final stitch pattern; and, (g) repeating steps (a) through (f) for each image of the plurality of images.
18 . The method for producing a plurality of stitch patterns of claim 17 further comprising the step of processing an image for use in automated embroidery into an initial stitch pattern prior to the measuring of the width of the initial stitch pattern.
19 . The method for producing a plurality of stitch patterns of claim 17 wherein steps (a) through (g) are performed by computer processing means compatible with existing computer processing means for use with automated embroidery machines.Join the waitlist — get patent alerts
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