Tft-lcd array substrate and method of manufacturing the same

Abstract

A thin film transistor liquid crystal display (TFT-LCD) array substrate comprising a gate line and a data line formed on a base substrate. The gate line and the data line intersect with each other to define a pixel region, in which a pixel electrode and a thin film transistor (TFT) are formed, and a first insulating layer and a second insulating layer are interposed between the gate line and the data line, and the pixel electrode is disposed between the first insulating layer and the second insulating layer. A method of manufacturing a TFT-LCD is also disclosed.

1 . A thin film transistor liquid crystal display (TFT-LCD) array substrate, comprising a gate line and a data line formed on a base substrate,
 wherein the gate line and the data line intersect with each other to define a pixel region, in which a pixel electrode and a thin film transistor (TFT) are formed, and   wherein a first insulating layer and a second insulating layer are interposed between the gate line and the data line, and the pixel electrode is disposed between the first insulating layer and the second insulating layer.   
   
   
       2 . The TFT-LCD array substrate according to  claim 1 , wherein the first insulating layer is formed on the gate line and a gate electrode of the thin film transistor;
 the pixel electrode is formed on the first insulating layer;   the second insulating layer is formed on the pixel electrode and the first insulating layer, and an insulating layer through hole is formed in the second insulating layer on the pixel electrode;   an active layer island is formed on the second insulating layer and above the gate electrode;   one end of a source electrode of the thin film transistor is formed on the active layer island, and the other end is connected with the data line;   one end of a drain electrode of the thin film transistor is formed on the active layer island, and the other end is connected with the pixel electrode via the insulating layer through hole; and   a TFT channel region is formed between the source electrode and the drain electrode.   
   
   
       3 . The TFT-LCD array substrate according to  claim 2 , wherein the active layer island comprises a semiconductor layer and a doped semiconductor layer stacked on the semiconductor layer, and
 in the TFT channel region, the doped semiconductor layer is completely etched and a portion of the semiconductor layer is etched so that the semiconductor layer of the TFT channel region is exposed.   
   
   
       4 . The TFT-LCD array substrate according to  claim 3 , wherein a surface of the semiconductor layer exposed through the doped semiconductor layer in the TFT channel region has an oxide layer formed by an oxidation treatment. 
   
   
       5 . The TFT-LCD array substrate according to  claim 1 , wherein a common electrode line is formed in the pixel region and overlaps with the pixel electrode to form a storage capacitor. 
   
   
       6 . The TFT-LCD array substrate according to  claim 1 , wherein the pixel electrode covers a portion of the gate line. 
   
   
       7 . The TFT-LCD array substrate according to  claim 5 , wherein the pixel electrode covers a portion of the gate line. 
   
   
       8 . A method of producing a thin film transistor liquid crystal display (TFT-LCD) array substrate, comprising:
 depositing a gate metal thin film on a base substrate and patterning the gate metal film to form a gate line and a gate electrode;   sequentially depositing a first insulating layer and a transparent conductive thin film on the base substrate and patterning the transparent conductive thin film to form a pixel electrode;   sequentially depositing a second insulating layer, a semiconductor thin film and a doped semiconductor thin film on the base substrate and patterning the second insulating layer, the semiconductor thin film and the doped semiconductor thin film to form an active layer island and an insulating layer through hole in the second insulating layer, wherein the insulating layer through hole is located over the pixel electrode; and   depositing a source/drain metal thin film on the base substrate and patterning the source/drain metal thin film to form a data line, a source electrode, a drain electrode and a TFT channel region, wherein the drain electrode is connected with the pixel electrode via the insulating layer through hole, and the doped semiconductor layer in the TFT channel region is completely etched to expose the underlying semiconductor thin film.   
   
   
       9 . The method of producing a TFT-LCD array substrate according to  claim 8 , wherein the forming of the active layer island and the insulating layer through hole comprises:
 sequentially depositing the second insulating layer, the semiconductor layer and the doped semiconductor layer by plasma enhanced chemical vapor deposition (PECVD) method;   coating a layer of photoresist on the doped semiconductor layer;   exposing the photoresist by using a half tone or gray tone mask so as to render the photoresist comprise a photoresist-fully-retained region corresponding to a region where the active layer island is to be formed, a photoresist-fully-removed region corresponding to a region where the insulating layer through hole pattern is to be formed, and a photoresist-partially-retained region corresponding to a region other than the above regions, wherein, after a developing process on the photoresist being exposed, a thickness of the photoresist in the photoresist-fully-retained region is unchanged, the photoresist in the photoresist-fully-removed region is removed, and a thickness of the photoresist in the photoresist-partially-retained region is reduced;   etching away, by a first etching process, the doped semiconductor layer, the semiconductor layer and the second insulating layer in the photoresist-fully-removed region to form the insulating layer through hole, from which the pixel electrode is exposed;   removing, by using an ashing process, the photoresist in the photoresist-partially-retained region so as to expose the doped semiconductor layer;   etching away, by a second etching process, the doped semiconductor layer and the semiconductor layer in the photoresist-partially-retained region so as to form the active layer island; and   removing the remaining photoresist.   
   
   
       10 . The method of producing a TFT-LCD array substrate according to  claim 8 , wherein the forming of the data line, the source electrode, the drain electrode and the TFT channel region comprises:
 depositing the source/drain metal layer by using a magnetron sputtering or thermal evaporation method; and   patterning the source/drain metal layer by using a normal mask so as to form the data line, the source electrode, the drain electrode and the TFT channel region,   wherein one end of the source electrode is formed on the active layer island and the other end of the source electrode is connected with the data line; one end of the drain electrode is formed on the active layer island and the other end of the drain electrode is connected with the pixel electrode via the insulating layer through hole;   and the doped semiconductor layer of the TFT channel region between the source electrode and the drain electrode is completely etched and a portion of the semiconductor layer is etched so that the semiconductor layer of the TFT channel region is exposed.   
   
   
       11 . The method of producing a TFT-LCD array substrate according to  claim 10 , wherein an oxidation treatment is performed on the exposed semiconductor layer in the TFT channel region so that an oxide layer is formed on the surface of the semiconductor layer exposed via the doped semiconductor layer. 
   
   
       12 . The method of producing a TFT-LCD array substrate according to  claim 11 , wherein the oxidation treatment has a radio frequency power of 5 KW-13 KW, an air pressure of 100 mT-500 mT, and a flow rate of oxygen of 1000 sccm-4000 sccm. 
   
   
       13 . The method of producing a TFT-LCD array substrate according to  claim 8 , wherein the first insulating layer is deposited by a high rate depositing method, and the second insulating layer is deposited by a low rate depositing method. 
   
   
       14 . The method of producing a TFT-LCD array substrate according to  claim 13 , wherein the high rate deposition has a radio frequency source power of 4500 W-7000 W, a flow rate of silane of 900 sccm-1600 sccm, and the low rate deposition has a radio frequency source power of 2500 W-4000 W, a flow rate of silane of 500 sccm-800 sccm. 
   
   
       15 . The method of producing a TFT-LCD array substrate according to  claim 8 , wherein, when the gate line and the gate electrode are formed, a common electrode line extending in parallel to the gate line is formed and overlaps with the pixel electrode to be formed. 
   
   
       16 . The method of producing a TFT-LCD array substrate according to  claim 8 , wherein the pixel electrode covers a portion of the gate line. 
   
   
       17 . The method of producing a TFT-LCD array substrate according to  claim 15 , wherein the pixel electrode covers a portion of the gate line. 
   
   
       18 . The method of producing a TFT-LCD array substrate according to  claim 8 , wherein an oxidation treatment is performed on the exposed semiconductor layer of the TFT channel region so that an oxide layer is formed on the surface of the semiconductor layer exposed via the doped semiconductor layer. 
   
   
       19 . The method of producing a TFT-LCD array substrate according to  claim 18 , wherein the oxidation treatment has a radio frequency power of 5 KW-13 KW, an air pressure of 100 mT-500 mT, and a flow rate of oxygen of 1000 sccm-4000 sccm.