Device with lifting and lowering drain tank for wet etching wafers

Abstract

The present invention discloses a device for spin cleaning and etching wet processor. The support is kept in a fixed level, and the drain tank can be lifting and lowering to collect and drain out the liquid from the support. This device consists of a suport, a set of drain tank and a lifting and lowering device to move the drain tank so that one of the drain tank is in the same level with the suport. The suport is used to support a wafer to process etching and cleaning, can spin with different speed and supply etching solution and DI water. The number of drain tanks are selected by the number of etching solutions and DI water. A stationary axaust appratus kept in a fixed level as the support is used to axaust the acidic gas from the drain tanks.

1 . A device for wet etching and cleaning with lifting and lowering drain tank, the support is kept in a fixed level and the selected annular duck of the drain tank can be lifting and lowering to the level of said suport to collect and drain out the liquid from the support, comprising:
 a support, kept in a fixed level, having a circular surface for supporting a wafer, is used for spin wet etching and cleaning said wafer;   a drain tank, is disposed around the concentrate circle of said support, said drain tank comprising at least two annular ducks to drain the liquid from said support, each annular ducks has an annular aperture connected to an air-extracting window of a stationary fixed bellows with a connecting window to remove the gas of the liquid;   a stationary axaust appratus, with a main air-extracting window, a plurality of secondary air-extracting window, a main axaust tube and a secondary axaust tube;   means for lifting and lowering said drain tank such that selected annular duck can be aligned with the surface of said support to drain the liquid from said support.   
   
   
       2 . A device as recited in  claim 1 , wherein said means for lifting and lowering is a lifting gear driving by a motor. 
   
   
       3 . A device as recited in  claim 1 , wherein said means for lifting and lowering is a pneumatic tool. 
   
   
       4 . A device as recited in  claim 1 , wherein said fixed axaust aparatus further comprising:
 an isolating brush, connecting said connecting window with said air-extracting window of said stationary axaust appratus by soft contaction to isolate the main exaust stream and the secondary exaust stream;   a driving aparatus, matching said air-extracting window with said connecting window during said drain tank moving up or down to isolate said secondary axaust tube and shut up said secondary air-extracting windows without drain tank;   a sealing partition, isolating each connecting window with the outer environment to isolate the acidic gas once more.   
   
   
       5 . A device as recited in  claim 4 , wherein said main air-extracting window is in the central position of all the air-extracting windows. 
   
   
       6 . A device as recited in  claim 4 , wherein the number of said secondary air-extracting windows is totally 2N−1, N−1 in the upper side and N−1 in the lower side of said main air-extracting window.