Wafer including a reinforcing flange formed upright at a periphery and method for manufacturing the same
Abstract
A wafer with an orientation notch being cut in a portion of its circumference, the wafer includes: a reinforcing flange formed upright at periphery; and a thin section surrounded by the reinforcing flange and having a smaller thickness than the reinforcing flange. The reinforcing flange includes a circumferential portion formed upright along the circumference and a notch portion formed upright near the orientation notch, and a width of the circumferential portion as viewed parallel to a major surface of the wafer is smaller than a depth of the orientation notch as viewed parallel to the major surface.
Claims
exact text as granted — not AI-modified1 . A method for manufacturing a wafer, the wafer with an orientation notch being cut in a portion of its circumference, the wafer including:
a reinforcing flange formed upright at periphery; and a thin section surrounded by the reinforcing flange and having a smaller thickness than the reinforcing flange, the reinforcing flange including a circumferential portion formed upright along the circumference and a notch portion formed upright near the orientation notch, and the width of the circumferential portion as viewed parallel to a major surface of the wafer being smaller than the depth of the orientation notch as viewed parallel to the major surface, the method comprising:
forming a mask at the periphery; and
forming the reinforcing flange by etching a portion not covered with the mask.
2 . The method according to claim 1 , wherein a taper or a curved surface is formed on an upper end of an inner wall of the reinforcing flange.
3 . The method according to claim 1 , wherein a taper or a curved surface is formed on a lower end of an inner wall of the reinforcing flange.
4 . The method according to claim 2 , wherein a taper or a curved surface is formed on a lower end of the inner wall of the reinforcing flange.
5 . A wafer with an orientation flat formed by cutting out a portion of its circumference, the wafer comprising:
a reinforcing flange formed upright at periphery; and a thin section surrounded by the reinforcing flange and having a smaller thickness than the reinforcing flange, as viewed parallel to a major surface of the wafer, a width of the reinforcing flange at the circumference being generally equal to a width of the reinforcing flange at the orientation flat.
6 . The wafer according to claim 5 , wherein an upper end of an inner wall of the reinforcing flange adjacent to the thin section has a taper or a curved surface.
7 . The wafer according to claim 5 , wherein a lower end of an inner wall of the reinforcing flange adjacent to the thin section has a taper or a curved surface.
8 . The wafer according to claim 6 , wherein a lower end of the inner wall of the reinforcing flange adjacent to the thin section has a taper or a curved surface.
9 . A method for manufacturing a wafer, the wafer with an orientation flat formed by cutting out a portion of its circumference, the wafer including:
a reinforcing flange formed upright at periphery; and a thin section surrounded by the reinforcing flange and having a smaller thickness than the reinforcing flange, as viewed parallel to a major surface of the wafer, a width of the reinforcing flange at the circumference being generally equal to a width of the reinforcing flange at the orientation flat, the method comprising:
forming a mask at the periphery; and
etching a portion not covered with the mask.
10 . The method according to claim 9 , wherein a taper or a curved surface is formed on an upper end of an inner wall of the reinforcing flange.
11 . The method according to claim 9 , wherein a taper or a curved surface is formed on a lower end of an inner wall of the reinforcing flange.
12 . The method according to claim 10 , wherein a taper or a curved surface is formed on a lower end of the inner wall of the reinforcing flange.Join the waitlist — get patent alerts
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