Nip apparatus and nip method

Abstract

The present invention provides a nip apparatus and a nip method which reduce consumption of gas used without scratches which are produced when a material to be treated (such as a band-shaped film and the like) is pressed against a support (such as a roll and the like). The invention is characterized in that a gas storage chamber, which stores gas with a pressure higher than outside atmospheric pressure, is disposed at a position facing a film, and the film is conveyed while being pressed against a roll with a reduced consumption of gas.

1 . A nip apparatus which presses a material to be treated provided on a supporting member against the supporting member by jetting gas onto the surface of the material, the nip apparatus comprising:
 a gas jetting device with a jetting opening disposed in a position facing the supporting member, the material being provided between the jetting opening and the supporting member,   wherein the gas jetting device comprises a gas introduction pipe for introducing gas to the jetting opening and a gas storage chamber with a jetting opening, connecting the gas introduction pipe and having a sectional area greater than that of the gas introduction pipe.   
     
     
         2 . The nip apparatus of  claim 1 , wherein the gas storage chamber stores gas with a pressure higher than outside atmospheric pressure. 
     
     
         3 . The nip apparatus of  claim 1 , further comprising a gas discharge device which sucks gas and discharges the sucked gas in the vicinity of a gap between the supporting member and the jetting opening. 
     
     
         4 . The nip apparatus of  claim 1 , wherein the supporting member is a rotatory roll and the material to be treated is a band-shaped film, the film being supported on the rotatory roll. 
     
     
         5 . A nip method which presses a material to be treated provided on a supporting member against the support member by jetting gas onto the surface of the material, the nip method comprising the steps of:
 introducing gas into a gas introduction pipe with a specific diameter; and   discharging gas from a gas storage chamber with a jetting opening, wherein the gas storage chamber connects the gas introduction pipe and has a sectional area greater than that of the gas introduction pipe.   
     
     
         6 . The apparatus of  claim 2 , further comprising a gas discharge device which sucks gas and discharges the sucked gas in the vicinity of a gap between the supporting member and the jetting opening. 
     
     
         7 . The apparatus of  claim 6 , wherein the supporting member is a rotatory roll and the material to be treated is a band-shaped film, the film being supported on the rotatory roll. 
     
     
         8 . The apparatus of  claim 2 , wherein the supporting member is a rotatory roll and the material to be treated is a band-shaped film, the film being supported on the rotatory roll. 
     
     
         9 . The apparatus of  claim 3 , wherein the supporting member is a rotatory roll and the material to be treated is a band-shaped film, the film being supported on the rotatory roll.