US2010204508A1PendingUtilityA1

Dendritic compound and use thereof

Assignee: IND TECH RES INSTPriority: Dec 30, 2004Filed: Apr 26, 2010Published: Aug 12, 2010
Est. expiryDec 30, 2024(expired)· nominal 20-yr term from priority
A61K 49/124
44
PatentIndex Score
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Claims

Abstract

A dendritic compound of the following structure: PD n -Z-L is disclosed. In the structure above, P is X—(CH 2 CH 2 —O) r —, r is an integer ranging from 1000 to 4000, X is OH, NH 2 , or OR, R is C 1 to C 10 alkyl, D n is a residue of branched C 3 to C 30 polyol compounds, n is the quantity of layers of the residue of branched compounds and is an integer equal to or greater than 1, L is a metal cation, Z is the residue of a C 3 to C 30 compound with multi functional groups. The functional groups illustrated above can be carboxylic groups, amino groups, amide groups, or chelating groups. The carboxylic groups, ester groups, amino groups, or amide groups bind to D n , and the chelating groups bind to the metal cations.

Claims

exact text as granted — not AI-modified
1 . A dendritic compound of following structure (I);
   PD n -Z-L  (I)   wherein,   P is X—(CH 2 CH 2 —O) r —, r is an integer equal to 1 or greater than 1, X is OH, NH 2  or OR, and R is C 1  to C 10  alkyl;   D n  is a residue of branched C 3  to C 30  polyol compounds, n is the quantity of layers of the residue of branched compounds and n is an integer equal to or greater than 1;   L is metal cations; and   Z is the residue of a C 3  to C 30  compounds with multi functional groups;   wherein, the functional groups are carboxylic groups, amino groups, ester groups, amide groups, or chelating groups; and the carboxylic groups, ester groups, amino groups, or amide groups bound to Dn, and the chelating groups bind to the metal cations.   
     
     
         2 . The dendritic compound as claimed in  claim 1 , wherein P is poly ethylene glycol. 
     
     
         3 . The dendritic compound as claimed in  claim 1 , wherein Dn is a residue of 2,2-bis(hydroxymethyl)propionic acid or the derivatives thereof. 
     
     
         4 . The dendritic compound as claimed in  claim 3 , wherein Dn is D 1  having a structure of formula (I): 
       
         
           
           
               
               
           
         
       
     
     
         5 . The dendritic compound as claimed in  claim 3 , wherein Dn is D 2  having a structure of formula (II): 
       
         
           
           
               
               
           
         
       
     
     
         6 . The dendritic compound as claimed in  claim 3 , wherein Dn is D 3  having a structure of formula (III): 
       
         
           
           
               
               
           
         
       
     
     
         7 . The dendritic compound as claimed in  claim 1 , wherein the L is a metal ion having a feature of exposure. 
     
     
         8 . The dendritic compound as claimed in  claim 7 , wherein L is Gadolinium (Gd). 
     
     
         9 . The dendritic compound as claimed in  claim 7 , wherein Z is a residue of ethylenedinitrilo tetraacetic acid (EDTA), or ethylenediimino dibyric acid (EDBA). 
     
     
         10 . The dendritic compound as claimed in  claim 9 , wherein Z is the structure of formula (IV): 
       
         
           
           
               
               
           
         
       
     
     
         11 . The dendritic compound as claimed in  claim 10 , wherein L is Gadolinium (Gd), and P is polyethylene glycol. 
     
     
         12 . The dendritic compound as claimed in  claim 6 , wherein L is Gadolinium (GD) and P is polyethylene glycol. 
     
     
         13 . The dendritic compound as claimed in  claim 1  exhibiting high contrast when used as an imaging agent in MRI imaging. 
     
     
         14 . A dendritic compound of following structure (I):
   PD n -Z-L  (I)   wherein,   P is X—(CH 2 CH 2 —O) r —, r is an integer equal to 1 or greater than 1, X is OH, NH 2  or OR, and R is C 1  to C 10  alkyl;   D n  is a residue of branched C 3  to C 30  polyol compounds, n is the quantity of layers of the residue of branched compounds and n is an integer equal to or greater than 1;   L is metal cations; and   Z is   a residue of ethylenedinitrilo tetraacetic acid (EDTA), ethylenediimino dibyric acid (EDBA), or a compound of formula (IV):   
       
         
           
           
               
               
           
         
       
     
     
         15 . The dendritic compound according to  claim 14 , wherein Z is EDTA. 
     
     
         16 . The dendritic compound according to  claim 14 , wherein Z is EDBA. 
     
     
         17 . The dendritic compound according to  claim 14 , wherein z is a compound having the structure of formula (IV): 
       
         
           
           
               
               
           
         
       
     
     
         18 . The dendritic compound as claimed in  claim 14 , wherein L is a metal ion having a feature of exposure. 
     
     
         19 . A dendritic compound of following structure (I):
   PD n -Z-L  (I)   wherein,   P is X—(CH 2 CH 2 —O) r —, r is an integer equal to 1 or greater than 1, X is OH, NH 2  or OR, and R is C 1  to C 10  alkyl;   D n  is a branched C 3  to C 30  polyol compound, n is an integer equal to or greater than 1 and is the quantity of layers of the branched compound that are present;   L is Gadolinium (Gd); and   Z is ethylenedinitrilo tetraacetic acid (EDTA), ethylenediimino dibyric acid (EDBA), or a compound having the structure of formula (IV):

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