Solution deposition method and apparatus with partiphobic substrate orientation

Abstract

A metal and oxygen material such as a transparent electrically conductive oxide material is electro deposited onto a substrate in a solution deposition process. Process parameters are controlled so as to result in the deposition of a high quality layer of material which is suitable for use in a back reflector structure of a high efficiency photovoltaic device. The deposition may be carried out in conjunction with a masking member which operates to restrict the deposition of the metal and oxygen material to specific portions of the substrate. In particular instances the deposition may be implemented in a continuous, roll-to-roll process. Further disclosed are semiconductor devices and components of semiconductor devices made by the present process, as well as apparatus for carrying out the process.

1 . A continuous process for the electro deposition of a layer of metal and oxygen material onto an elongated, substantially planar substrate web, said method comprising the steps of:
 providing an electroplating apparatus which includes at least one deposition station operative to electro deposit a layer of a metal and oxygen material onto at least one surface of a portion of said substrate web disposed therein;   continuously advancing said substrate web through said at least one deposition station; and   maintaining said web in a partiphobic orientation while it is advancing through said at least one deposition station, whereby the accumulation of particulate contaminants on said substrate web is minimized.   
     
     
         2 . The method of  claim 1 , wherein said partiphobic orientation is a vertical orientation. 
     
     
         3 . The method of  claim 1 , wherein said apparatus includes at least two deposition stations. 
     
     
         4 . The method of  claim 1 , wherein said at least one deposition station is operative to deposit a layer of a zinc and oxygen material onto said substrate. 
     
     
         5 . The method of  claim 1 , wherein said deposition station includes an electrolyte material therein and wherein said apparatus includes a transducer which is operative to introduce ultrasonic energy into said electrolyte material. 
     
     
         6 . The method of  claim 1 , wherein said deposition station includes an electrolyte material therein and wherein said apparatus is operative to bubble a gas through said electrolyte. 
     
     
         7 . An apparatus for electro depositing a layer of a metal and oxygen material onto a substantially planar, elongated web of substrate material in a continuous process, said apparatus comprising:
 at least one deposition station, said at least one deposition station including an electrolyte and at least one electrode;   a substrate web drive operative to continuously advance said web of substrate material through said at least one deposition station so that a portion of said web is disposed in said electrolyte in a partiphobic orientation and in a spaced apart relationship with the at least one electrode;   a power supply which is in electrical communication with said substrate web and said at least one deposition station, said power supply being operative to establish a flow of electrical current between the at least one electrode, the electrolyte material, and the substrate, which current flow electro deposits said metal oxygen material onto that portion of the web of substrate material which is disposed in said spaced apart relationship with said at least one electrode whereby the accumulation of particulate contaminants on the substrate web is minimized.   
     
     
         8 . The apparatus of  claim 7 , wherein said apparatus includes a plurality of deposition stations. 
     
     
         9 . The apparatus of  claim 7 , wherein said at least one deposition station includes a plurality of electrodes. 
     
     
         10 . The apparatus of  claim 7 , wherein said apparatus is further configured to affix a masking member onto a portion of the substrate prior to the deposition of any of said metal and oxygen material thereonto. 
     
     
         11 . The apparatus of  claim 10 , wherein said masking material is configured as a belt which is rotatably supported in said apparatus so as to contact a surface of said portion of said web of substrate material which is disposed in said spaced apart relationship with said electrode. 
     
     
         12 . The apparatus of  claim 10 , wherein said masking material is magnetically affixable to said substrate. 
     
     
         13 . The apparatus of  claim 7 , wherein said at least one electrode is a zinc electrode and said apparatus is operable to deposit a layer of zinc and oxygen material onto said web of substrate material. 
     
     
         14 . The apparatus of  claim 13 , wherein said electrolyte comprises a solution of Zn(NO 3 ) 2 . 
     
     
         15 . The apparatus of  claim 7 , wherein said partiphobic orientation is a vertical orientation.