US2010188629A1PendingUtilityA1

Manufacturing apparatus for liquid crystal device, manufacturing method for liquid crystal device, liquid crystal device and electronic device

Assignee: SEIKO EPSON CORPPriority: Jul 14, 2005Filed: Mar 30, 2010Published: Jul 29, 2010
Est. expiryJul 14, 2025(expired)· nominal 20-yr term from priority
G02F 1/13C09K 2323/00C09K 2323/02G02F 1/133734G02F 1/1303
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Claims

Abstract

A manufacturing apparatus for a liquid crystal device having a pair of substrates facing each other, an oriented film formed on an facing surface of at least one substrate in the pair of the substrates, and a liquid crystal held between the pair of substrates, includes: a film formation chamber; an evaporating section having an evaporation source, evaporating an inorganic material on the substrate in the film formation chamber by a physical vapor deposition, and forming an oriented film and a base film arranged under the oriented film; a base film formation area forming the base film and located substantially above the evaporation source in the film formation chamber; and an oriented film formation area located obliquely above the evaporation source in the film formation chamber, forming the oriented film and having a shielding plate having an elongated opening for selectively evaporating an inorganic material.

Claims

exact text as granted — not AI-modified
1 . A liquid crystal device having a pair of substrates facing each other, an oriented film formed on a facing surface of at least one substrate in the pair of the substrates, and a liquid crystal held between the pair of substrates, which is manufactured by a manufacturing apparatus comprising:
 a film formation chamber;   an evaporating section having an evaporation source, evaporating an inorganic material on the substrate in the film formation chamber by a physical vapor deposition, and forming an oriented film and a base film arranged under the oriented film;   a base film formation area forming the base film and located substantially above the evaporation source in the film formation chamber; and   an oriented film formation area located obliquely above the evaporation source in the film formation chamber, forming the oriented film, and having a shielding plate having an elongated opening for selectively evaporating an inorganic material.   
   
   
       2 . An electronic device comprising:
 the liquid crystal device according to  claim 1 .   
   
   
       3 . A manufacturing method for a liquid crystal device, comprising:
 preparing a pair of substrates;   forming a base film on at least one substrate in the pair of the substrates;   forming an oriented film on the base film;   applying a liquid crystal onto the oriented film; and   making the pair of substrates to face each other so that the oriented film is disposed therebetween, and the liquid crystal is held therebetween, wherein   the forming of at least a part of the base film on one substrate and the forming of the oriented film on another substrate are performed in parallel process by a same evaporating section in a film formation chamber.   
   
   
       4 . The manufacturing method for liquid crystal device according to  claim 3 , wherein the forming of the base film, includes:
 forming the base film by the evaporating section as the same evaporation forming the oriented film; and   forming the base film by the evaporating section differed from the evaporation forming the oriented film.   
   
   
       5 . The manufacturing method for liquid crystal device according to  claim 3 , wherein the base film is formed on the substrate while rotating the substrate. 
   
   
       6 . A liquid crystal device, which is manufactured by the manufacturing method according to  claim 3 . 
   
   
       7 . An electronic device comprising:
 the liquid crystal device according to  claim 6 .

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