Charged particle beam pvd device, shielding device, coating chamber for coating substrates, and method of coating

Abstract

A charged particle beam PVD device is provided, including a target of coating material inside of a casing, a vapor aperture provided in the casing, and a shielding device provided adjacent to the vapor aperture, the shielding device being on floating potential.

1 . A charged particle beam PVD device, comprising
 a target of coating material inside of a casing,   a vapor aperture provided in the casing, and   a shielding device provided adjacent to the vapor aperture, the shielding device being on floating potential.   
   
   
       2 . The charged particle beam PVD device of  claim 1 , wherein
 the shielding device is positioned at the circumference of the vapor aperture.   
   
   
       3 . The charged particle beam PVD device of  claim 1 , wherein
 the shielding device extends into the vapor aperture.   
   
   
       4 . The charged particle beam PVD device of  claim 1 , wherein the shielding device is positioned between the target of coating material and the vapor aperture. 
   
   
       5 . The charged particle beam PVD device of  claim 1 , wherein the vapor aperture is positioned between the shielding device and the target of coating material. 
   
   
       6 . The charged particle beam PVD device of  claim 1 , wherein the shielding device is mounted to the casing via an isolating connector. 
   
   
       7 . The charged particle beam PVD device of  claim 1 , wherein the shielding device is mounted to the casing via an isolating connector having a self-shielding structure. 
   
   
       8 . The charged particle beam PVD device of  claim 1 , wherein the vapor aperture has an elongated form with two ends opposite to each other and the shielding device includes at least one element selected from the group consisting of a first shield provided at one of the ends and a second shield provided at the other end. 
   
   
       9 . The charged particle beam PVD device of  claim 1 , wherein the distance of the shielding device from the target is in a range of 40 mm to 70 mm. 
   
   
       10 . The charged particle beam PVD device of  claim 1 , wherein the distance of the shielding device from the target is at least 55 mm. 
   
   
       11 . The charged particle beam PVD device of  claim 1 , wherein the charged particle beam PVD device is at least one element selected from an electron beam PVD device, an ion beam PVD device, a sputtering device, a plasma sputtering device, a charged particle beam sputtering device, an electron beam sputtering device, and an ion beam sputtering device. 
   
   
       12 . A shielding device for a charged particle beam PVD device,
 the charged particle beam PVD device comprising an target of coating material inside of a casing and   a vapor aperture provided in the casing,   the shielding device being adapted to be provided adjacent to the vapor aperture and being adapted to be provided on floating potential.   
   
   
       13 . The shielding device of  claim 12 , comprising an isolating connector having a self-shielding structure and being adapted for mounting the shielding device to a charged particle beam PVD device. 
   
   
       14 . A coating chamber for coating substrates, comprising
 a substrate support, and   a charged particle beam PVD device including   a target of coating material inside of a casing,   a vapor aperture provided in the casing, and   a shielding device provided adjacent to the vapor aperture, the shielding device being on floating potential.   
   
   
       15 . The coating chamber of  claim 14 , wherein the shielding device comprises an isolating connector having a self-shielding structure and being adapted for mounting the shielding device to the charged particle beam PVD device. 
   
   
       16 . The coating chamber of  claim 14 , wherein
 the substrate support includes a transport system adapted to transport the one or more substrates along a transport path,   the charged particle beam PVD device comprises an elongated vapor aperture with two ends opposite to each other and the shielding device includes at least one element selected from the group consisting of a first shield provided at one of the ends and a second shield provided at the other end, and wherein   the charged particle beam PVD device is provided in the coating chamber such that the elongated vapor aperture is positioned across the transport path.   
   
   
       17 . The coating chamber of  claim 16 , wherein the shielding device comprises an isolating connector having a self-shielding structure and being adapted for mounting the shielding device to the charged particle beam PVD device. 
   
   
       18 . The coating chamber of  claim 16 , wherein
 the transport path has two boundaries opposite to each other and   the charged particle beam PVD device is provided in the coating chamber such that the first shield faces one boundary of the transport path and the second shield faces the other boundary of the transport path.   
   
   
       19 . A method of coating one or more substrates in a coating chamber, comprising:
 providing a substrate on a substrate support of the coating chamber having a charged particle beam PVD device,   wherein the charged particle beam PVD device includes   a target of coating material inside of a casing,   a vapor aperture provided in the casing, and   a shielding device provided adjacent to the vapor aperture, the shielding device being on floating potential; and   dispensing coating material from the charged particle beam PVD device towards the substrate.   
   
   
       20 . The method of  claim 19 , wherein the shielding device is mounted to the casing via at least one element selected from the group consisting of an isolating connector and an isolating connector having a self-shielding structure. 
   
   
       21 . The method of  claim 19 , wherein
 the substrate support includes a transport system adapted to transport the one or more substrates along a transport path,   the charged particle beam PVD device comprises an elongated vapor aperture with two ends opposite to each other and the shielding device includes at least one element selected from the group consisting of a first shield provided at one of the ends and a second shield provided at the other end, and wherein   the charged particle beam PVD device is provided in the coating chamber such that the elongated vapor aperture is positioned across the transport path of the substrates.   
   
   
       22 . The method of  claim 21 , wherein the shielding device is mounted to the casing via at least one element selected from the group consisting of an isolating connector and an isolating connector having a self-shielding structure. 
   
   
       23 . The method of  claim 21 , further comprising
 providing the substrate by feeding the substrate into the coating chamber and arranging the substrate on the substrate support,   continuously or discontinuously transporting the substrate by the transport system along the transport direction while dispensing coating material from the charged particle beam PVD device, and   discharging the substrate from the coating chamber.   
   
   
       24 . The method of  claim 21 , wherein
 the transport path has two boundaries opposite to each other and   the charged particle beam PVD device is provided in the coating chamber such that the first shield faces one boundary of the transport path and the second shield faces the other boundary of the transport path.   
   
   
       25 . The method of  claim 24 , further comprising
 providing the substrate by feeding the substrate into the coating chamber and arranging the substrate on the substrate support,   continuously or discontinuously transporting the substrate by the transport system along the transport direction while dispensing coating material from the charged particle beam PVD device, and   discharging the substrate from the coating chamber.