Projection exposure apparatus, projection exposure method, and method for producing device

Abstract

A projection exposure apparatus transfers a pattern formed on a mask onto a substrate through a liquid. The projection exposure apparatus includes an optical member which projects an image of the pattern onto the substrate and an electricity removal device which removes electricity from the liquid to be supplied to a space between the optical member and a surface of the substrate by adding an additive to the liquid to suppress the liquid from being charged.

1 . A projection exposure apparatus which transfers a pattern formed on a mask onto a substrate through a liquid, the projection exposure apparatus comprising:
 an optical member which projects an image of the pattern onto the substrate; and   an electricity removal device which removes electricity from the liquid to be supplied to a space between the optical member and a surface of the substrate by adding an additive to the liquid to suppress the liquid from being charged.   
   
   
       2 . A projection exposure apparatus which transfers a pattern formed on a mask onto a substrate through a liquid, the projection exposure apparatus comprising:
 an optical member which projects an image of the pattern onto the substrate; and   an electricity removal device which removes electricity from the liquid intervened between the optical member and a surface of the substrate by adding an additive to the liquid to suppress the liquid from being charged.   
   
   
       3 . An exposure method for exposing a substrate with a pattern formed on a mask through a liquid and an optical member, the exposure method comprising:
 adding an additive to the liquid to suppress the liquid from being charged;   supplying the liquid to a space between the optical member and a surface of the substrate; and   irradiating the mask with an exposure light beam.   
   
   
       4 . The method according to  claim 3 , wherein the liquid is pure water and the additive is carbon dioxide. 
   
   
       5 . The method according to  claim 3 , wherein the liquid is supplied to the space through a piping. 
   
   
       6 . The method according to  claim 5 , wherein an inner wall of the piping is subjected to a coating with an antistatic agent. 
   
   
       7 . A method for manufacturing a device, comprising:
 exposing a substrate by using the exposure method as defined in  claim 3 ; and   developing the exposed substrate to manufacture the device.