Negative ion generating hat

Abstract

A negative ion generating hat is provided. The hat is configured in a way that a predetermined space portion is formed between an inner of the hat and a lower band of the inner surface and a negative ion generating fabric is inserted into the space portion, thereby preventing a negative ion generating coating from being easily stripped off in spite of a stretching or creasing of a band.

1 . A negative ion generating hat  1 , which has a stretch band  2  mounted on a lower band of the inner surface,
 wherein the hat  1  is configured in such a way that an inner  11  of the hat  1  and the band  2  are connected by first and second stitch lines  21  and  22  extending in parallel with each other, respectively, adjacent to upper and lower ends of the band  2 , and a predetermined space portion  23  is formed between the band  2  and the inner  11  by means of the first and second stitch lines  21  and  22 ; and   a strip-shaped negative ion generating fabric  3  is inserted into the space portion  23 , at least two portions, including both opposite ends of the negative ion generating fabric  3 , are fastened to the band  2  by means of a third stitch line  24 , and one or more foldable portion  31  is formed by folding the negative ion generating fabric  3  so that the foldable portion  31  is unfolded when the band  2  stretches.   
   
   
       2 . The negative ion generating hat of  claim 1 , wherein the negative ion generating fabric  3  to be inserted into the space portion  23  is expanded as it is wound in a spiral manner.