Method of manufacturing a substrate for organic electroluminescent device

Abstract

Disclosed is a method of manufacturing a substrate for an organic EL device, the method comprising the step of: filling grooves of the optical element with sol-gel coating solution or organic metal cracking solution when a diffraction grating 12 is formed on the glass substrate 11 , wherein an encapsulation member 5 is mounted to the glass substrate 11 in order to fill the groove 12 a with the coating solution, and the coating solution is injected into a gap between the encapsulation member 5 and the diffraction grating 12 , so that the organic EL device can be stably manufactured with low variation between optical properties according to positions of the substrate and with improved luminous efficiency. Further, the present invention provides a method of manufacturing a substrate for an organic EL device having a glass substrate 11 with an diffraction grating 12 , wherein the dispersion solution of particles is applied to the glass substrate 11 to form the diffraction grating 12 , so that the organic EL device can be stably manufactured with low variation between the optical properties according to the positions of the is substrate and with the improved luminous efficiency.

1 . A method of manufacturing a substrate for an organic EL device, which comprises an optical element and an organic layer of an emitting layer interposed between an anode and a cathode, the method comprising the step of:
 applying an etchant to the substrate in order to form the optical element.   
   
   
       2 . The method as claimed in  claim 1 , wherein the optical element is any one of a diffraction grating and a scattering surface. 
   
   
       3 . The method as claimed in  claim 1 , wherein the dispersion solution of particles and the etchant are applied by any one of a spray method and an inkjet method. 
   
   
       4 . The method as claimed in  claim 2 , wherein the dispersion solution of particles is any one of sol-gel coating solution or organic metal cracking solution, and a layer formed by the coating solution is any one of a silicon oxide layer (SiO 2 ), a titanium oxide (TiO 2 ), an indium tin oxide (ITO), a zinc oxide (ZnO 2 ), a zirconium oxide (ZrO 2 ), a tantalum pentoxide layer (Ta 2 O 5 ), and an aluminum oxide layer (Al 2 O 3 ). 
   
   
       5 . The method as claimed in  claim 2 , wherein the dispersion solution of particles has a static surface tension of 20˜50 dyne/cm relative to the substrate. 
   
   
       6 . The method as claimed in  claims 2 , wherein the dispersion solution of particles has a viscosity of 1˜10 cps. 
   
   
       7 . The method as claimed in  claim 2 , wherein the dispersion solution of particles has a blended concentration of 10% or less of gross weight. 
   
   
       8 . The method as claimed in  claim 1 , wherein the etchant contains hydrofluoric acid as a main component.