Liquid processing method, liquid processing apparatus and storage medium

Abstract

Disclosed is a liquid processing method, apparatus, and storage device for cleaning a member disposed at holding part-side of a substrate, such as a lift pin plate (including a lift pin) or a holding plate, with a rinsing liquid, thereby preventing a chemical liquid adhered to such a member from having a bad influence on the wafer. The liquid processing method includes holding the substrate by a holding part, rotating the substrate held by the holding part through a rotation driving part, and supplying a chemical liquid to a holding part-side surface of the substrate by a chemical liquid supply part. After the supply of the chemical liquid, rinsing liquid droplets are generated and supplied to the holding part-side surface of the substrate by supplying gas toward the holding part-side surface of the substrate through a gas supply part and supplying a rinsing liquid toward the holding part-side surface of the substrate through a rinsing liquid supply part. After the supply of the rinsing liquid droplets, a rinsing liquid is additionally supplied to the holding part-side surface of the substrate through the rinsing liquid supply part.

1 . A liquid processing method comprising:
 holding a substrate by a holding part;   rotating the substrate held by the holding part through a rotation driving part;   supplying a chemical liquid to a holding part-side surface of the substrate by a chemical liquid supply mechanism;   generating and supplying rinsing liquid droplets to the holding part-side surface of the substrate by supplying gas toward the holding part-side surface of the substrate through a gas supply part and supplying a rinsing liquid toward the holding part-side surface of the substrate through a rinsing liquid supply mechanism after the supply of the chemical liquid; and   additionally supplying a rinsing liquid to the holding part-side surface of the substrate by the rinsing liquid supply mechanism after the supply of the rinsing liquid droplets.   
   
   
       2 . The liquid processing method of  claim 1 , wherein the chemical liquid supply mechanism has a chemical liquid supply pipe to guide the chemical liquid toward the holding part-side surface of the substrate, and the method further comprises discharging the chemical liquid within the chemical liquid supply pipe before the supply of the rinsing liquid droplet. 
   
   
       3 . The liquid processing method of  claim 1 , further comprising preliminarily supplying a rinsing liquid to the holding part-side surface of the substrate by the rinsing liquid supply mechanism before the supply of the rinsing liquid droplet. 
   
   
       4 . The liquid processing method of  claim 1 , further comprising drying the substrate by supplying gas to the holding part-side surface of the substrate by the gas supply part after the additional supply of the rinsing liquid. 
   
   
       5 . A liquid processing apparatus comprising:
 a holding part to hold a substrate;   a rotation driving part to rotate the holding part;   a chemical liquid supply mechanism to supply a chemical liquid to the substrate;   a rinsing liquid supply mechanism to supply a rinsing liquid to the substrate;   a gas supply part to supply gas to a holding part-side surface of the substrate; and   a control device to control the rotation driving part, the chemical liquid supply mechanism, the rinsing liquid supply mechanism, and the gas supply part so that the rotation driving part rotates the substrate held by the holding part, the chemical liquid supply mechanism supplies the chemical liquid to the holding part-side surface of the substrate, rinsing liquid droplets is generated and supplied to the holding part-side surface of the substrate by supplying the gas toward the holding part-side surface of the substrate through the gas supply part and supplying the rinsing liquid toward the holding part-side surface of the substrate through the rinsing liquid supply mechanism, and the rinsing liquid supply mechanism supplies the rinsing liquid to the holding part-side surface of the substrate.   
   
   
       6 . A storage medium storing a computer program to execute a liquid processing method by a liquid processing apparatus, the liquid processing method comprising:
 holding a substrate by a holding part;   rotating the substrate held by the holding part through a rotation driving part;   supplying a chemical liquid to a holding part-side surface of the substrate by a chemical liquid supply mechanism;   generating and supplying rinsing liquid droplets to the holding part-side surface of the substrate by supplying gas toward the holding part-side surface of the substrate through a gas supply part and supplying a rinsing liquid toward the holding part-side surface of the substrate through a rinsing liquid supply mechanism after the supply of the chemical liquid; and   additionally supplying a rinsing liquid to the holding part-side surface of the substrate by the rinsing liquid supply mechanism after the supply of the rinsing liquid droplets.