Crystallization-free glass frit compositions and frits made therefrom for microreactor devices

Abstract

A borosilicate glass composition suitable for manufacturing microreactor glass frits includes 12-22 mol % B 2 O 3 =12-22; 68-80 mol % SiO 2 ; 3-8 mol % Al 2 O 3 , 1-8 mol % Li 2 O, and one of 0.5±0.1 mol % ZrO 2 and 1.1±0.5 mol % F. After sintering a glass frit having the borosilicate glass composition, the glass frit has a surface crystalline layer of 30 μm or less or is amorphous throughout.

1 . A borosilicate glass composition suitable for manufacturing microreactor glass frits, said borosilicate glass composition comprising in mole percent (mol %):
 12-22 mol % B 2 O 3 ,   68-80 mol % SiO 2 ,   3-8 mol % Al 2 O 3 ,   1-8 mol % Li 2 O, and   0.5±0.1 mol % ZrO 2 ,   wherein after sintering a glass frit having said borosilicate glass composition, the glass frit has a surface crystalline layer of 30 μm or less or is amorphous throughout.   
   
   
       2 . The borosilicate glass composition of  claim 1 , which consists essentially of:
 13.4±2 mol % B 2 O 3 ,   72.6±2 mol % SiO 2 ,   6.5±1 mol % Al 2 O 3 ,   6.9±1 mol % Li 2 O, and   0.5±0.1 mol % ZrO 2 .   
   
   
       3 . The borosilicate glass composition of  claim 1 , which consists essentially of:
 13.4±0.5 mol % B 2 O 3 ,   72.6±0.5 mol % SiO 2 ,   6.5±0.4 mol % Al 2 O 3 ,   6.9±0.4 mol % Li 2 O, and   0.5±0.1 mol % ZrO 2 .   
   
   
       4 . A borosilicate glass composition suitable for manufacturing microreactor glass frits, said borosilicate glass composition comprising in mole percent (mol %):
 12-22 mol % B 2 O 3 ,   68-80 mol % SiO 2 ,   3-8 mol % Al 2 O 3 ,   1-8 mol % Li 2 O, and   1.1±0.5 mol % F,   wherein after sintering a glass frit having said borosilicate glass composition, the glass frit has a surface crystalline layer of 30 μm or less or is amorphous throughout.   
   
   
       5 . The borosilicate glass composition of  claim 4 , further comprising less than 3 mol % Na 2 O. 
   
   
       6 . The borosilicate glass composition of  claim 4 , further comprising 1.1±0.5 mol % CaO. 
   
   
       7 . The borosilicate glass composition of  claim 4 , further comprising 1.1±0.5 mol % CaO and less than 3 mol % Na 2 O. 
   
   
       8 . The borosilicate glass composition of  claim 7 , which consists essentially of:
 20.4±1.6 mol % B 2 O 3 ,   70.2±2 mol % SiO 2 ,   3.4±1 mol % Al 2 O 3 ,   1.4±0.8 mol % Li 2 O,   2.3±0.5 mol % Na 2 O,   1.1±0.5 mol % CaO, and   1.1±0.5 mol % F.   
   
   
       9 . The borosilicate glass composition of  claim 7 , which consists essentially of:
 20.4±0.5 mol % B 2 O 3 ,   70.2±0.5 mol % SiO 2 ,   3.4±0.4 mol % Al 2 O 3 ,   1.4±0.2 mol % Li 2 O,   2.3±0.2 mol % Na 2 O,   1.1±0.2 mol % CaO, and   1.1±0.2 mol % F.   
   
   
       10 . A borosilicate glass composition suitable for manufacturing microreactor glass frits, said borosilicate glass composition consisting essentially of in mole percent (mol %):
 12-22 mol % B 2 O 3 ,   68-80 mol % SiO 2 ,   3-8 mol % Al 2 O 3 ,   1-8 mol % Li 2 O, and   0.5±0.1 mol % ZrO 2 ,   wherein after sintering a glass frit having said borosilicate glass composition, the glass frit has a surface crystalline layer of 30 μm or less or is amorphous throughout.