US2010116338A1PendingUtilityA1
High quality semiconductor material
Est. expiryNov 7, 2028(~2.3 yrs left)· nominal 20-yr term from priority
H10F 77/1668H10F 77/1665H10F 77/1662H10F 77/1228H10F 71/1215H10F 71/1035H10F 71/121H10F 71/103H10F 10/172H10F 10/17H10F 10/00Y02E10/547Y02P70/50Y02E10/548
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Claims
Abstract
A hydrogenated, silicon based semiconductor alloy has a defect density of less than 10 16 cm −3 . The alloy may comprise a hydrogenated silicon alloy or a hydrogenated silicon-germanium alloy. Hydrogen content of the alloy is generally less than 15%, and in some instances less than 11%. The tandem photovoltaic devices which incorporate the alloy exhibit low levels of photo degradation. In some instances, the material is fabricated by a high speed VHF deposition process.
Claims
exact text as granted — not AI-modified1 . A hydrogenated silicon-germanium semiconductor alloy having a defect density of less than 10 16 cm −3 .
2 . (canceled)
3 . The semiconductor alloy of claim 1 , wherein the defect density is less than 8×10 15 cm −3 .
4 . The semiconductor alloy of claim 1 , wherein the defect density is approximately 7×10 15 cm −3 .
5 . The semiconductor alloy of claim 1 , wherein the hydrogen content thereof is less than 15%.
6 . The semiconductor alloy of claim 1 , further characterized in that when said alloy comprises the i layer of a p-i-n type photovoltaic cell, that cell manifests a photo-induced degradation, under open circuit conditions, of less than 15% when exposed to A.M. 1.5 illumination for 1,000 hours at 50° C.
7 . The semiconductor alloy of claim 1 , further characterized in that when said alloy comprises one of the i layers in a triple junction photovoltaic cell having an initial efficiency of at least 9%, that cell manifests a photo-induced degradation, under open circuit conditions, of less than 10% when exposed to A.M. 1.5 illumination for 1,000 hours at 50° C.
8 . (canceled)
9 . The semiconductor alloy of claim 1 , wherein at least a portion of said semiconductor material has a microstructure configured as a plurality of columns separated by microvoids.
10 . A photovoltaic device which includes the semiconductor alloy of claim 1 .
11 . A hydrogenated silicon based semiconductor alloy characterized in that when said alloy comprises the i layer of a p-i-n type photovoltaic cell, that cell manifests a photo-induced degradation, under open circuit conditions, of less than 15% when exposed to A.M. 1.5 illumination for 1,000 hours at 50° C.
12 . The semiconductor alloy of claim 1 , wherein said alloy is an amorphous hydrogenated silicon-germanium alloy.
13 . A hydrogenated, silicon based semiconductor alloy characterized in that when it comprises one of the i layers in a triple junction photovoltaic cell having an initial efficiency of at least 9% that cell manifests a photo-induced degradation, under open circuit conditions, of less than 10% when exposed to A.M. 1.5 illumination for 1,000 hours at 500 C.
14 . (canceled)
15 . The semiconductor alloy of claim 13 , further characterized in that it has a defect density of less than 8×10 15 cm −3 .
16 . The semiconductor alloy of claim 13 , further characterized in that it has a defect density of approximately 7×10 15 cm −3 .
17 . The semiconductor alloy of claim 13 , wherein the hydrogen content thereof is less than 15%.
18 . The semiconductor alloy of claim 13 , wherein at least a portion of said semiconductor material has a microstructure configured as a plurality of columns separated by microvoids.
19 . A photovoltaic device which includes the semiconductor alloy of claim 13 .
20 . A hydrogenated silicon based semiconductor alloy having a defect density of less than 10 16 cm −3 , wherein at least a portion of said semiconductor material has a microstructure configured as a plurality of columns separated by microvoids.
21 . The semiconductor alloy of claim 20 , wherein the hydrogen content thereof is less than 15%.Join the waitlist — get patent alerts
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