Process equipment architecture

Abstract

Embodiments of the present invention relate to improvements to single-substrate, multi-chamber processing platform architecture for minimizing fabrication facility floor space requirements. Prior art systems require significant floor space around all sides to allow for adequate installation and servicing. Embodiments of the present invention provide platforms that allow for servicing the chambers and supporting systems via a front and rear of the platform allowing multiple, side-by-side platform placement within a fabrication facility, while providing improved serviceability of the platform components.

1 . A platform for substrate processing equipment, comprising:
 a frame member having a single-substrate processing chamber attached thereto;   a factory interface unit attached to the frame member adjacent the processing chamber;   a power unit attached to the frame member on an end of the platform opposite the factory interface unit; and   a central service corridor separating the processing chamber from the power unit, wherein the central service corridor has a length extending from a first side of the platform to a second side of the platform and a width of at least about 36 inches.   
   
   
       2 . The platform of  claim 1 , further comprising a second single substrate process chamber attached to the frame member adjacent the factory interface unit. 
   
   
       3 . The platform of  claim 2 , wherein the factory interface unit includes an access panel disposed between the single-substrate processing chamber and the second single-substrate processing chamber. 
   
   
       4 . The platform of  claim 1 , further comprising a second power unit separated from the power unit via a rear service corridor. 
   
   
       5 . The platform of  claim 4 , wherein the rear service corridor has a length extending from a rear side of the platform and intersecting the central service corridor. 
   
   
       6 . The platform of  claim 5 , wherein the rear service corridor has a width separating the power unit from the second power unit of at least about 42 inches. 
   
   
       7 . The platform of  claim 6 , further comprising a first and a second substrate receiving member attached to the factory interface unit. 
   
   
       8 . The platform of  claim 7 , wherein the factory interface unit has an access panel separating the first and second substrate receiving members. 
   
   
       9 . The platform of  claim 8 , further comprising a gas supply system disposed beneath the central service corridor. 
   
   
       10 . A substrate processing system, comprising:
 a first single-substrate processing chamber and a second single-substrate processing chamber, each attached to a mainframe;   a factory interface unit attached to the first and second single-substrate processing chambers having a first factory interface access panel and a second factory interface access panel disposed thereon;   a first power unit and a second power unit attached to the mainframe and separated by a rear service corridor; and   a central service corridor separating the first and second single-substrate processing chambers from the first and second power units, wherein the central service corridor has a length extending from a first side of the substrate processing system to a second side of the substrate processing system and a width separating the processing chamber from the power units of about 36 inches or greater.   
   
   
       11 . The substrate processing system of  claim 10 , wherein the rear service corridor has a length extending from a rear side of the processing system and intersecting the central service corridor. 
   
   
       12 . The substrate processing system of  claim 11 , wherein the rear service corridor has a width separating the first power unit from the second power unit of about 42 inches or greater. 
   
   
       13 . The substrate processing system of  claim 12 , wherein the first power unit has an access panel adjacent the rear service corridor and the second power unit has an access panel adjacent the rear service corridor. 
   
   
       14 . The substrate processing system of  claim 13 , wherein the first factory interface access panel is configured between the first and second single-substrate processing chambers. 
   
   
       15 . A system for substrate processing equipment, comprising:
 a first single-substrate, multi-chamber processing platform having a first side and a second side with a central service corridor having a length extending from the first side of the first platform to the second side of the first platform and a width of at least about 36 inches;   a second single-substrate, multi-chamber processing platform having a first side and a second side with a central service corridor having a length extending from the first side of the second platform to the second side of the second platform and a width of at least about 36 inches;   wherein the second side of the first platform is juxtaposed the first side of the second platform such that the central service corridor of the first platform is substantially aligned with the central service corridor of the second platform.   
   
   
       16 . The system of  claim 15 , wherein the first and second platforms each have a first single-substrate processing chamber and a second single-substrate processing chamber adjacent the service corridor and attached to a factory interface unit with an access panel separating the first and second processing chambers. 
   
   
       17 . The system of  claim 16 , wherein the first and second platforms each have a power unit disposed adjacent the service corridor opposite the first and second single-substrate processing chambers. 
   
   
       18 . The system of  claim 17 , wherein the first and second platforms each have a second power unit disposed adjacent the service corridor opposite the first and second single-substrate processing chambers. 
   
   
       19 . The system of  claim 18 , wherein the first and second platforms each have a rear service corridor separating the power unit from the second power unit and having a length extending from the rear of the platform and intersecting the central service corridor and a width of at least about 42 inches. 
   
   
       20 . The system of  claim 19 , wherein the power unit and the second power unit of each of the first and second platforms each have an access panel disposed adjacent the rear service corridor.