Method for growing silicon single crystal
Abstract
The present invention provides a method for growing a carbon-doped silicon single crystal that grows a silicon single crystal from a raw material melt in a crucible having carbon added therein by the Czochralski method, wherein an extruded material or a molded material is used as a dopant for adding the carbon to a raw material in the crucible. As a result, there can be provided the method for growing a carbon-doped silicon single crystal, by which the carbon can be easily doped in the silicon single crystal at low cost and a carbon concentration in the silicon single crystal can be accurately controlled in a silicon single crystal pulling up process by the Czochralski method.
Claims
exact text as granted — not AI-modified1 . A method for growing a carbon-doped silicon single crystal that grows a silicon single crystal from a raw material melt in a crucible having carbon added therein by the Czochralski method, wherein an extruded material or a molded material is used as a dopant for adding the carbon to a raw material in the crucible.
2 . The method for growing a carbon-doped silicon single crystal according to claim 1 , wherein the dopant consisting of the extruded material or the molded material is obtained by crushing an extruded material or a molded material to grains.
3 . The method for growing a carbon-doped silicon single crystal according to claim 1 , wherein the dopant is put into the crucible together with a silicon raw material, and then the raw material is melted to grow the single crystal.
4 . The method for growing a carbon-doped silicon single crystal according to claim 2 , wherein the dopant is put into the crucible containing a silicon raw material or the melt from the upper side, and then the single crystal is grown.
5 . The method for growing a carbon-doped silicon single crystal according to claim 1 , wherein the dopant is put into the crucible containing a silicon raw material or the melt from the upper side, and then the single crystal is grown.
6 . The method for growing a carbon-doped silicon single crystal according to claim 2 , wherein the dopant is put into the crucible containing a silicon raw material or the melt from the upper side, and then the single crystal is grown.Join the waitlist — get patent alerts
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