Photocatalytic reactions in nano-imprint lithography processes

Abstract

An imprint lithography template having a photoactive coating adhered to a surface of the template. Irradiation of the photoactive coating promotes cleaning of the template by decomposition of organic material proximate the template (e.g., organic material adsorbed on the template). An imprint lithography system may be configured such that template cleaning is achieved during formation of a patterned layer on an imprint lithography substrate. Cleaning of the template during an imprint lithography process reduces down-time that may be associated with template maintenance.

1 . An imprint lithography template comprising:
 an etched-back surface;   an imprint lithography mold comprising a wall, wherein the mold extends from the etched-back surface a distance defined by the wall; and   a photoactive coating adhered to the etched-back surface.   
     
     
         2 . The imprint lithography template of  claim 1 , further comprising a photoactive coating adhered to the wall. 
     
     
         3 . The imprint lithography template of  claim 1 , wherein the mold comprises a multiplicity of protrusions configured to contact a polymerizable material in an imprint lithography process. 
     
     
         4 . The imprint lithography template of  claim 1 , wherein the photoactive coating comprises a metal oxide. 
     
     
         5 . The imprint lithography template of  claim 4 , wherein the metal oxide comprises titania. 
     
     
         6 . The imprint lithography template of  claim 1 , wherein the photoactive coating is activated by exposure to ultraviolet radiation. 
     
     
         7 . The imprint lithography template of  claim 1 , wherein the photoactive coating is activated by exposure to visible radiation. 
     
     
         8 . The imprint lithography template of  claim 1 , wherein the photoactive coating is formed by a vapor deposition process. 
     
     
         9 . The imprint lithography template of  claim 1 , wherein the photoactive coating is formed by a sol-gel process. 
     
     
         10 . The imprint lithography template of  claim 1 , wherein the photoactive coating is operable to decompose organic material proximate the coating following irradiation of the coating in the presence of oxygen. 
     
     
         11 . The imprint lithography template of  claim 10 , wherein the photoactive coating is operable to decompose organic material on the coating following irradiation of the coating. 
     
     
         12 . The imprint lithography template of  claim 1 , wherein the photoactive coating is doped with a metal. 
     
     
         13 . The imprint lithography template of  claim 1 , wherein the photoactive coating is doped with a non-metal. 
     
     
         14 . An imprint lithography system comprising an imprint lithography template, wherein the template comprises a photoactive coating, and the photoactive coating is configured to decompose organic material proximate the template upon irradiation of the template in the presence of oxygen-containing species. 
     
     
         15 . The imprint lithography system of  claim 14 , wherein the template comprises an etched-back surface and a mold, the mold comprising a wall, wherein the mold extends from the etched-back surface a distance defined by the wall, and the photoactive coating is adhered to the etched-back surface of the template. 
     
     
         16 . The imprint lithography system of  claim 15 , wherein the photoactive coating is adhered to the wall of the mold. 
     
     
         17 . The imprint lithography system of  claim 14 , wherein the photoactive coating comprises a metal oxide. 
     
     
         18 . An imprint lithography method comprising:
 disposing a polymerizable material on a surface of an imprint lithography substrate;   contacting the polymerizable material with an imprint lithography template, wherein a portion of the imprint lithography template is coated with a photoactive material;   irradiating the polymerizable material to form a solidified layer between the imprint lithography template and the imprint lithography substrate; and   separating the imprint lithography template from the solidified layer,   wherein irradiating the polymerizable material comprises activating the photoactive coating, and activating the photoactive coating promotes decomposition of organic material proximate the template.   
     
     
         19 . The method of  claim 18 , further comprising irradiating the photoactive coating after separating the imprint lithography template from the solidified layer, wherein irradiating the photoactive coating initiates decomposition of organic material on the surface of the imprint lithography template. 
     
     
         20 . The method of  claim 18 , wherein decomposition of the organic material comprises formation of carbon dioxide and water.