US2010107977A1PendingUtilityA1
Film forming apparatus
Est. expiryFeb 9, 2021(expired)· nominal 20-yr term from priority
H10P 14/43C23C 16/4557C23C 16/45572H01J 37/3244C23C 16/45565
48
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Claims
Abstract
A film-forming apparatus of the invention is a film-forming apparatus that includes: a processing container that defines a chamber, a pedestal arranged in the chamber, on which a substrate to be processed can be placed, a showerhead provided opposite to the pedestal, which has a large number of gas-discharging holes, a gas-supplying mechanism that supplies a process gas into the chamber through the showerhead, and a showerhead-temperature controlling unit that controls a temperature of the showerhead.
Claims
exact text as granted — not AI-modified1 . A film-forming apparatus comprising:
a chamber in which a substrate to be processed is processed, a stage arranged in the chamber, on which the substrate to be processed can be placed, a heater buried in the stage, and a showerhead provided opposite to the stage, which has a large number of gas-discharging holes, a lid member mounted on an upper part of the chamber, which has an opening, a showerhead-temperature controlling unit arranged in an upper part of the showerhead, which controls a temperature of the showerhead, chamber gas passages formed at the chamber, which respectively supply a film-forming gas and a cleaning gas, lid-member gas passages formed at the lid member, which respectively communicate with the chamber gas passages, gas-introducing pipes connected to the showerhead, which respectively communicate with the chamber gas passages and the lid-member gas passages and supply the film-forming gas and the cleaning gas into the showerhead, a plasma-generating unit for generating plasma of the film-forming gas in the chamber, a discharging unit for exhausting the chamber, a circular insulating member for insulating the showerhead from the chamber, an infilling member for infilling a space surrounded by a periphery of the showerhead and a side wall of the chamber, for preventing plasma from being formed at the space, a fixing member for fixing the infilling member, and a gas-spring type of inverting mechanism that inverts the showerhead by turning the showerhead outwardly from the chamber.
2 . A film-forming apparatus according to claim 2 , wherein
the showerhead-temperature controlling unit includes: an inside heater arranged correspondingly to the substrate to be processed, and an outside heater arranged so as to surround the inside heater.
3 . A film-forming apparatus according to claim 1 , further comprising
another insulating member having insulating-member gas passages respectively connected to the gas-introducing pipes, and a gas-introducing member having gas-introducing-member gas passages respectively connected to the insulating-member gas passages.
4 . A film-forming apparatus according to claim 2 , further comprising
another insulating member having insulating-member gas passages respectively connected to the gas-introducing pipes, and a gas-introducing member having gas-introducing-member gas passages respectively connected to the insulating-member gas passages.
5 . A film-forming apparatus according to claim 1 , further comprising
an heat insulating member arranged above the heaters via an atmospheric air space.
6 . A film-forming apparatus according to claim further comprising
an heat insulating member arranged above the heaters via an atmospheric air space.
7 . A film-forming apparatus according to claim 3 , further comprising
an heat insulating member arranged above the heaters via an atmospheric air space.
8 . A film-forming apparatus according to claim 4 , further comprising
an heat insulating member arranged above the heaters via an atmospheric air space.
9 . A film-forming apparatus according to claim 1 , wherein
the showerhead has:
an upper plate,
a middle plate, and
a lower plate,
a first space is formed between the upper plate and the middle plate, and a second space is formed between the middle plate and the lower plate.
10 . A film-forming apparatus according to claim 2 , wherein
the showerhead has:
an upper plate,
a middle plate, and
a lower plate,
a first space is formed between the upper plate and the middle plate, and a second space is formed between the middle plate and the lower plate.
11 . A film-forming apparatus according to claim 3 , wherein
the showerhead has:
an upper plate,
a middle plate, and
a lower plate,
a first space is formed between the upper plate and the middle plate, and a second space is formed between the middle plate and the lower plate.
12 . A film-forming apparatus according to claim 4 , wherein
the showerhead has:
an upper plate,
a middle plate, and
a lower plate,
a first space is formed between the upper plate and the middle plate, and a second space is formed between the middle plate and the lower plate.
13 . A film-forming apparatus according to claim 1 , wherein
the infilling member consists of quartz.Join the waitlist — get patent alerts
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