Process Excursion Detection

Abstract

A method for analyzing defect information on a substrate, including logically dividing the substrate into zones, and detecting defects on the substrate to produce the defect information. The defect information from the substrate is analyzed on a zone by zone basis to produce defect level classifications for the defects within each zone. The zonal defect level classifications are analyzed according to at least one analysis method. The defect level classifications are preferably selected from a group of defect level classifications that is specified by a recipe. Preferably, the at least one analysis method includes at least one of zonal defect distribution, automatic defect classification, spatial signature analysis, and excursion detection. The defect level classifications preferably include at least one of individual defect, defect cluster, and spatial signature analysis signature. In one embodiment the defect information is logically divided into configurable zones after the defects on the substrate have been detected.

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       11 . A method for detecting process excursions, the method comprising the steps of:
 detecting defects on a selectable set of substrates,   compositing the defects detected on the set of substrates into an effectual substrate defect set, and   analyzing the effectual substrate defect set with a spatial analysis routine.   
   
   
       12 . The method of  claim 11 , wherein the spatial analysis routine includes at least one of spatial signature analysis and repeater analysis. 
   
   
       13 . The method of  claim 11 , wherein the selectable set of substrates includes substrates that all belong to a given lot. 
   
   
       14 . The method of  claim 11 , wherein the selectable set of substrates includes every n th  substrate from a given data set, where n is an integer that is greater than one. 
   
   
       15 . The method of  claim 11 , wherein the step of compositing the defects into an effectual substrate defect set includes at least one of translating and rotating a data set from a given substrate as needed to align with data sets from other substrates. 
   
   
       16 . A method for classifying defects on a substrate, the method comprising the steps of:
 analyzing the defects with a first analysis routine that is adapted to classify larger patterns of defects, and   analyzing the defects that were not classified with the first analysis routine with a second analysis routine that is adapted to classify smaller defects, using output from the first analysis routine as input to the second analysis routine.   
   
   
       17 . The method of  claim 16 , wherein the first analysis routine is spatial signature analysis. 
   
   
       18 . The method of  claim 16 , wherein the second analysis routine is automated defect classification. 
   
   
       19 . The method of  claim 16 , wherein the output from the first analysis routine includes bounding boxes from a spatial signature analysis. 
   
   
       20 . The method of  claim 16 , wherein the first analysis routine is spatial signature analysis and the second analysis routine is automated defect classification, and the output from the first analysis routine includes bounding boxes.