Microlithographic projection exposure apparatus

Abstract

A microlithographic projection exposure apparatus contains an illumination system ( 12 ) for generating projection light ( 13 ) and a projection lens ( 20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120 ) with which a reticle ( 24 ) that is capable of being arranged in an object plane ( 22 ) of the projection lens can be imaged onto a light-sensitive layer ( 26 ) that is capable of being arranged in an image plane ( 28 ) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L 5; L 205; L 605; L 705; L 805; L 905; L 1005; L 1105 ) of the projection lens on the image side is immersed in an immersion liquid ( 34; 334 a; 434 a; 534 a). A terminating element ( 44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144 ) that is transparent in respect of the projection light ( 13 ) is fastened between the final lens element on the image side and the light-sensitive layer.

1 . An apparatus which, during operation, directs radiation along a path from an object plane to an image plane in a microlithography projection system, the apparatus comprising:
 a first optical assembly comprising a plurality of first optical elements arranged along the path; and   a second optical assembly adjustably mounted with respect to the first optical assembly, the second optical assembly comprising one or more second optical elements positioned in the path including a final optical element, where the final optical element is the optical element closest to the image plane along the path, the final optical element having a surface facing the image plane,   wherein the apparatus is a microlithography projection objective configured to include a liquid between the surface of the final optical element and the image plane, during operation, and to image an object positioned at the object plane onto a surface at the image plane using radiation having a wavelength of 193 nm or less, the apparatus having a numerical aperture at the image plane greater than 1.   
     
     
         2 . The apparatus of  claim 1 , wherein the second optical assembly is detachable from the first optical assembly without modification of the first optical assembly. 
     
     
         3 . The apparatus of  claim 1 , wherein the second optical assembly comprises a plurality of fastening elements that are fastened to the first optical assembly. 
     
     
         4 . The apparatus of  claim 3 , wherein the first optical assembly comprises a housing that contains the plurality of first optical elements and the fastening elements are fastened to the housing. 
     
     
         5 . The apparatus of  claim 4 , wherein the fastening elements comprise connectors accessible from outside the apparatus. 
     
     
         6 . The apparatus of  claim 5 , wherein the connectors are screws. 
     
     
         7 . The apparatus of  claim 1 , wherein the second optical assembly comprises actuators configured to adjust the second optical elements relative to the first optical elements. 
     
     
         8 . The apparatus of  claim 7 , wherein the actuators are micrometer screws. 
     
     
         9 . The apparatus of  claim 1 , wherein the first optical assembly comprises a housing that contains the plurality of first optical elements and the second optical elements are positioned outside of the housing. 
     
     
         10 . The apparatus of  claim 1 , wherein the liquid is water. 
     
     
         11 . The apparatus of  claim 1 , wherein the final optical element is the only second optical element in the second optical assembly. 
     
     
         12 . The apparatus of  claim 1 , wherein the second optical assembly comprises a second optical element positioned in the path between the final optical element and the first optical elements. 
     
     
         13 . The apparatus of  claim 1 , wherein the final optical element is a lens. 
     
     
         14 . The apparatus of  claim 13 , wherein the lens comprises a curved surface. 
     
     
         15 . The apparatus of  claim 13 , wherein the lens is a plano-convex lens. 
     
     
         16 . The apparatus of  claim 1 , wherein the apparatus is configured to include the liquid between a surface of a first optical element closest to the image plane and a surface of a second optical element furthest from the image plane, during operation. 
     
     
         17 . A microlithography projection system which, during operation, directs radiation along a path to a substrate at an image plane, the microlithography projection system comprising:
 an illumination system which, during operation, provides the radiation to an object positioned at an object plane, the radiation having a wavelength of 193 nm or less;   a projection objective comprising a first optical assembly and a second optical assembly adjustably mounted with respect to the first optical assembly, the first optical assembly comprising a plurality of first optical elements arranged along the path between the object plane and the image plane, and the second optical assembly comprising one or more second optical elements positioned in the path between the first optical assembly and the image plane, the second optical assembly including a final optical element, where the final optical element is the optical element closest to the image plane along the path and the final optical element has a surface facing the image plane;   a stage configured to position the substrate at the image plane; and   a liquid supply apparatus which, during operation, provides a liquid between the surface of the final optical element and the substrate,   wherein, during operation, the projection objective forms an image of the object at the image plane with the radiation, the projection objective having a numerical aperture at the image plane greater than 1.