US2010041317A1PendingUtilityA1
Workpiece processing method
Est. expiryAug 18, 2028(~2 yrs left)· nominal 20-yr term from priority
Inventors:Toshiki Miyai
H10P 52/00
48
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Claims
Abstract
A method of processing a workpiece having a plurality of multi-crystal silicon columns embedded in single-crystal silicon includes a grinding step for grinding only the single-crystal silicon by use of a grinding tool and an abrasive step for concurrently polishing the single-crystal silicon and the multi-crystal silicon columns by use of an abrasive tool in a dry manner to expose all the heads of the multi-crystal silicon columns to the front surface of the single-crystal silicon.
Claims
exact text as granted — not AI-modified1 . A method of processing a workpiece having a plurality of multi-crystal silicon columns embedded in single-crystal silicon, comprising:
an abrasive step of polishing the single-crystal silicon and the multi-crystal silicon columns by use of an abrasive tool in a dry manner to expose all heads of the multi-crystal silicon columns to a front surface the single-crystal silicon.
2 . The method according to claim 1 , further comprising:
a grinding step of grinding the single-crystal silicon by use of a grinding tool before the abrasive step.Join the waitlist — get patent alerts
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