Lightweight camouflage veil systems and related methods

Abstract

Veil systems for providing camouflage and methods for making the same are provided. The veil system can include a base substrate having a first side and a second side with a first camouflage pattern printed on the first side of the base substrate. The veil system can also include an outer mesh having a first side and a second side with the first camouflage pattern printed on the first side of the outer mesh. The base substrate and the outer mesh can be connectable so that the first side of the base substrate faces the second side of the outer mesh and the first side of the outer mesh faces outward. The first camouflage pattern on the first side of the base substrate substantially aligns with the first camouflage pattern on the first side of the outer mesh. The outer mesh provides visibility from the second side through the first side of the outer mesh to permit observation beyond the veil system.

1 . A veil system for providing camouflage comprising;
 a base substrate having a first side and a second side with a first camouflage pattern printed on the first side of the base substrate;   an outer mesh having a first side and a second side with the first camouflage pattern printed on the first side of the outer mesh;   the base substrate and the outer mesh being configured to be connectable together so that the first side of the base substrate faces the second side of the outer mesh and the first side of the outer mesh faces outward so that the first camouflage pattern on the first side of the base substrate substantially aligns with the first camouflage pattern on the first side of the outer mesh; and   the outer mesh being configured to provide visibility from the second side through the first side of the outer mesh to permit observation beyond the veil system.   
   
   
       2 . The veil system according to  claim 1  wherein the base substrate is a thermoplastic film. 
   
   
       3 . The veil system according to  claim 1  wherein the base substrate is a PVC film.
 The veil system according to  claim 3  wherein the base substrate further comprises a polyester support fabric backing.   
   
   
       4 . The veil system according to  claim 3  wherein the PVC film has at least one window defined therein. 
   
   
       5 . The veil system according to  claim 4  wherein the at least one window is defined by crosshair slits that form retractable and extendable flaps. 
   
   
       6 . The veil system according to  claim 5  wherein the flaps have fasteners to hold the flaps in open and/or closed position. 
   
   
       7 . The veil system according to  claim 1  wherein the base substrate is a mesh. 
   
   
       8 . The veil system according to  claim 7  wherein the substrate mesh is configured to have openings therein that facilitate close proximity visibility therethrough. 
   
   
       9 . The veil system according to  claim 8  wherein the openings in the substrate mesh are between about 0.8 mm to about 1.5 mm. 
   
   
       10 . The veil system according to  claim 1  wherein the outer mesh is configured to have free hanging flaps to give an arbitrary three-dimensionality to the veil system that facilitate radar and signature absorption and reflection. 
   
   
       11 . The veil system according to  claim 10  wherein the outer mesh is configured to have openings therein that facilitate close proximity visibility therethrough. 
   
   
       12 . The veil system according to  claim 11  wherein the openings in the substrate mesh are between about 0.8 mm to about 1.5 mm. 
   
   
       13 . The veil system according to  claim 1  wherein the first camouflage pattern comprises a site-specific digital photographic image. 
   
   
       14 . The veil system according to  claim 1  wherein the first camouflage pattern comprises:
 a photographic image; and   a disruptive pattern of at least one color configured on the photographic image, the at least one color being selected from a range of colors from at least one of the photographic image or an operating environment in which the camouflage is intended to be used.   
   
   
       15 . The veil system according to  claim 14 , further comprising additional micropatterns configured on the photographic image, the micropatterns being smaller than the disruptive patterns. 
   
   
       16 . The veil system according to  claim 15 , wherein the micropatterns include one or more additional colors selected from the range of colors, the one or more additional colors including colors not used in the disruptive pattern. 
   
   
       17 . The veil system according to  claim 15 , further comprising one or more additional disruptive patterns configured on the photographic image, the one or more additional disruptive patterns including one or more additional colors not used in the disruptive pattern and selected from the range of colors. 
   
   
       18 . The veil system according to  claim 1  wherein the first camouflage pattern comprises:
 a base photographic image; and   one or more distorting disruptive patterns including images having different focal lengths configured on the base photographic image.   
   
   
       19 . The veil system according to  claim 18 , wherein the base photographic image comprises a site-specific photographic image. 
   
   
       20 . The veil system according to  claim 18 , wherein the images having different focal lengths comprises one or more site-specific photographic images or portions of one or more site-specific photographic images. 
   
   
       21 . The veil system according to  claim 18 , wherein the images having different focal lengths comprise portions of one or more different photographic images than the base photographic image. 
   
   
       22 . The veil system according to  claim 18 , wherein the images having different focal lengths comprise portions of the base photographic image. 
   
   
       23 . The veil system according to  claim 18 , wherein the different focal lengths include improper focal lengths that make the image appear to be out of focus. 
   
   
       24 . The veil system according to  claim 18 , further comprising one or more additional disruptive patterns of at least one color from a range of colors from at least one of the base digital photographic image or an operating environment in which the camouflage is intended to be used. 
   
   
       25 . The veil system according to  claim 24 , further comprising additional micropatterns configured on the digital photographic image, the micropatterns being smaller than the disruptive patterns. 
   
   
       26 . The veil system according to  claim 25 , wherein the micropatterns include one or more additional colors selected from the range of colors, the one or more additional colors including colors not used in the disruptive pattern. 
   
   
       27 . The veil system according to  claim 1  wherein the first camouflage pattern comprises:
 a plurality of disruptive patterns;   each disruptive pattern including portions of an image having a different focal length than the focal lengths of the images included in the other disruptive patterns; and   the disruptive patterns integrated together to form the camouflage pattern.   
   
   
       28 . The veil system according to  claim 27 , wherein images having different focal lengths comprises one or more site-specific photographic images or portions of one or more site-specific photographic images. 
   
   
       29 . The veil system according to  claim 28 , further comprising one or more additional disruptive patterns of at least one color from a range of colors from at least one of the site-specific photographic images or an operating environment in which the camouflage is intended to be used. 
   
   
       30 . The veil system according to  claim 29 , further comprising additional micropatterns configured on the plurality of disruptive patterns, the micropatterns being smaller than the disruptive patterns. 
   
   
       31 . The veil system according to  claim 30 , wherein the micropatterns include one or more additional colors selected from the range of colors, the one or more additional colors being chosen from colors not used in the disruptive pattern. 
   
   
       32 . The veil system according to  claim 27 , wherein the different focal length of at least one of the images in one of the disruptive patterns comprises an improper focal length that make the image appear to be out of focus. 
   
   
       33 . The veil system according to  claim 1  wherein the second side of the base substrate includes a second camouflage pattern and the second side of the outer mesh includes the second camouflage pattern. 
   
   
       34 . The veil system according to  claim 33  wherein the base substrate and the outer mesh are configured to be reversibly connectable so that the second side of the base substrate faces the first side of the outer mesh and the second side of the outer mesh faces outward so that the second camouflage pattern on the second side of the base substrate substantially aligns with the second camouflage pattern on the second side of the outer mesh, and the outer mesh being configured to provide visibility from the first side through the second side of the outer mesh to permit observation beyond the veil system. 
   
   
       35 . The veil system according to  claim 33  wherein the base substrate comprises a mesh and the outer mesh and the substrate mesh are reversible such that the second side of the substrate mesh faces outward and the second side of the outer mesh faces the first side of the substrate mesh and the substrate mesh and outer mesh being configured to provide visibility from a first side of the outer mesh through the second side of the substrate mesh to permit observation beyond the veil system. 
   
   
       36 . The veil system according to  claim 1  further comprising a second outer mesh secured to the outward facing side of the outer mesh, the second outer mesh being configured to have free hanging flaps to give an arbitrary three-dimensionality to the veil system that facilitate radar and signature absorption and reflection. 
   
   
       37 . The veil system according to  claim 1  further comprising an overcoating secured to the first side of the base substrate. 
   
   
       38 . A method for creating a veil system for providing camouflage, the method comprising:
 printing a camouflage pattern on a first side of a base substrate;   printing the camouflage pattern on a first side of an outer mesh, the outer mesh being configured to provide visibility from a second side of the outer mesh through the first side of the outer mesh to permit observation beyond the veil system; and   connecting the base substrate and the outer mesh together so that the first side of the base substrate faces the second side of the outer mesh and the first side of the outer mesh faces outward so that the first camouflage pattern on the first side of the base substrate substantially aligns with the first camouflage pattern on the first side of the outer mesh.   
   
   
       39 . The method according to  claim 38  wherein the base substrate is a PVC film. 
   
   
       40 . The method according to  claim 39  further comprising backing the PVC film with a polyester support fabric. 
   
   
       41 . The method according to  claim 38  further comprising defining windows in the PVC film. 
   
   
       42 . The method according to  claim 41  wherein the windows defined by crosshair slits that form retractable and extendable flaps. 
   
   
       43 . The method according to  claim 42  wherein the flaps have fasteners to hold the flaps in open and/or closed position. 
   
   
       44 . The method according to  claim 38  wherein the base substrate is a mesh. 
   
   
       45 . The method according to  claim 38  further comprising cutting the outer mesh to form free hanging flaps to give an arbitrary three-dimensionality to the veil system that facilitate radar and signature absorption and reflection.