US2010025257A1PendingUtilityA1
Method for surface treating metal substrate
Assignee: SHENZHEN FUTAIHONG PREC IND COPriority: Jul 30, 2008Filed: Dec 29, 2008Published: Feb 4, 2010
Est. expiryJul 30, 2028(~2 yrs left)· nominal 20-yr term from priority
Inventors:De Gao
C25D 5/48C25D 5/34C25D 11/02C23C 14/024
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Claims
Abstract
A method of treating a metal substrate comprise the steps of: anodizing the metal substrate to create pores on the surface of the substrate; and treating the metal substrate by NCVM to form a NCVM coating on the surface of the substrate.
Claims
exact text as granted — not AI-modified1 . A method of treating a metal substrate, comprising:
anodizing the metal substrate to create pores on the surface of the substrate; and treating the metal substrate by NCVM to form a NCVM coating on the surface of the substrate.
2 . The method as claimed in claim 1 , wherein the metal substrate is magnesium alloy or aluminum alloy.
3 . The method as claimed in claim 1 , wherein the anodizing step is performed using sulphuric acid, orthophosphoric acid, or chromic acid.
4 . The method as claimed in claim 1 , further comprising a step of degreasing the metal substrate before the step of anodizing.
5 . The method as claimed in claim 4 , wherein the step of degreasing is performed using trichloroethylene solution.Join the waitlist — get patent alerts
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