Method and Compositions for Treatment of Subsurface Contaminants

Abstract

Compositions and methods are provided for oxidizing subsurface contaminants. Compositions include compatible combinations of surfactants, cosolvents and chemical oxidants. Compositions have been identified that provide compatible combinations of surfactants and chemical oxidants that maximize oxidant productivity on solubilized contaminants. The compositions and methods are especially effective on the treatment of dense non-aqueous phase liquids or DNAPLs.

1 - 9 . (canceled) 
   
   
       10 . A composition comprising:
 one or more sulfonated surfactants;   one or more permanganate chemical oxidants; and   a cosolvent or co-surfactant.   
   
   
       11 - 13 . (canceled) 
   
   
       14 . The method of  claim 10 , wherein the co-surfactant is a sulfonated co-surfactant. 
   
   
       15 . (canceled) 
   
   
       16 . The composition of  claim 10  wherein the cosolvent is tertiary butyl alcohol. 
   
   
       17 . The composition of  claim 10  wherein the sulfonated surfactant is present at from about 0.1 wt % to about 10 wt %, the permanganate chemical oxidant is present at from about 0.1 wt % to about 10 wt % and the cosolvent is present at from about 2 wt % to about 5 wt %. 
   
   
       18 . The method of  claim 10  wherein the one or more sulfonated surfactant is sodium dioctyl sulfosuccinate, the permanganate chemical oxidant is potassium permanganate and the cosolvent is tertiary butyl alcohol. 
   
   
       19 . The method of  claim 10 , wherein the sulfonated surfactant is selected from the group consisting of sodium dioctyl sulfosuccinate, disodium hexadecyl diphenyl oxide disulfonate, sodium dodecyl sulfate and C16 linear sodium diphenyl oxide sulfonate. 
   
   
       20 . The method of  claim 10 , wherein the permanganate chemical oxidant is selected from the group consisting of sodium permanganate and potassium permanganate. 
   
   
       21 . The method of  claim 14 , wherein the sulfonated co-surfactant is selected from the group consisting of sodium dioctyl sulfosuccinate, disodium hexadecyl diphenyl oxide disulfonate, sodium dodecyl sulfate and C16 linear sodium diphenyl oxide sulfonate.