Cover element for a sonotrode and peening chamber arrangement for the surface peening of components

Abstract

A cover element for a sonotrode which is to be configured, in particular, for accelerating peening material within a peening chamber for the surface peening of components and is to be operated by a vibration exciter of the sonotrode, at least one wall, in particular a wall portion of a chamber wall of the peening chamber, being provided, which is mounted in a predefined position on the cover element and is to be moved together with the same is disclosed. In addition, a peening chamber arrangement for the surface peening of components, in particular for ultrasonic shot peening, including a peening chamber that is bounded by at least one chamber wall; and at least one sonotrode having a cover element which includes at least one wall portion of the chamber wall that is to be moved together with the same is disclosed.

1 - 15 . (canceled) 
     
     
         16 . A cover element for a sonotrode for use in accelerating peening material within a peening chamber for the surface peening of components, the peening chamber element being operated by a vibration exciter of the sonotrode, the cover element comprising:
 a base portion; and   at least one wall portion mounted in a predefined position on the base portion, the at least one wall portion being movable with the base portion, a ratio between the height of the at least one wall portion and the width of the base portion being between 1:6 and 1:14.   
     
     
         17 . The cover element recited in  claim 16  wherein the ratio between the height of the at least one wall portion and the width of the base portion is 1:10. 
     
     
         18 . The cover element recited in  claim 16  wherein the base portion is disk-shaped and a ratio between the height of the at least one wall portion and the diameter of the base portion is between 1:6 and 1:14. 
     
     
         19 . The cover element recited in  claim 18  wherein the ratio between the height of the at least one wall portion and the diameter of the base portion is 1:10. 
     
     
         20 . The cover element as recited in  claim 16  wherein the at least one wall portion is configured on a lateral peripheral region of the base portion. 
     
     
         21 . The cover element as recited in  claim 16  wherein the at least one wall portion extends peripherally around the base portion. 
     
     
         22 . The cover element as recited in  claim 16  wherein the at least one wall portion is removably attached to the base portion. 
     
     
         23 . The cover element as recited in  claim 16  wherein a positioning of the at least one wall portion on the base portion is fixedly adjustable. 
     
     
         24 . The cover element as recited in  claim 16  wherein the at least one wall portion is positioned at an approximately right angle in relation to the base portion. 
     
     
         25 . A peening chamber arrangement for the surface peening of components comprising:
 a peening chamber bounded by a chamber wall; and   at least one sonotrode having a peening element configured to accelerate peening material within the peening chamber,   the peening element including a cover element and at least one wall portion mounted in a predefined position on the cover element, the at least one wall portion being movable with the cover element, a ratio between the height of the at least one wall portion and the width of the cover element being between 1:6 and 1:14.   
     
     
         26 . The peening chamber arrangement as recited in  claim 25  wherein the at least one wall portion forms at least a portion of the chamber wall. 
     
     
         27 . The peening chamber arrangement as recited in  claim 26  further comprising a guide element, the guide element being attached to the at least one wall portion and forming a portion of the chamber wall. 
     
     
         28 . The peening chamber arrangement as recited in  claim 25  wherein the at least one wall portion is configured on a lateral peripheral region of the cover element. 
     
     
         29 . The peening chamber arrangement as recited in  claim 25  wherein the at least one wall portion extends peripherally around the cover element. 
     
     
         30 . The peening chamber arrangement as recited in  claim 25  wherein the at least one wall portion is removably attached to the cover element. 
     
     
         31 . The peening chamber arrangement as recited in  claim 25  wherein a positioning of the at least one wall portion on the cover element is fixedly adjustable. 
     
     
         32 . The peening chamber arrangement as recited in  claim 25  wherein the at least one wall portion is positioned at an approximately right angle in relation to the cover element. 
     
     
         33 . The peening chamber arrangement as recited in  claim 25  further comprising a guide element, the guide element being attached to the at least one wall portion. 
     
     
         34 . The peening chamber arrangement as recited in  claim 33  wherein a positioning of the guide element is fixedly adjustable with respect to the at least one wall portion. 
     
     
         35 . The peening chamber arrangement as recited in  claim 25  further comprising a first device capable of ascertaining an impact frequency of the peening material accelerated within the peening chamber, the first device being mounted the component being peened on a side of the component that faces away from the cover element. 
     
     
         36 . The peening chamber arrangement as recited in  claim 35  further comprising a second device capable of postmetering peening material to be accelerated within the peening chamber. 
     
     
         37 . The peening chamber arrangement as recited in  claim 36  wherein the second device is controllable as a function of the impact frequency ascertained by the first device. 
     
     
         38 . The peening chamber arrangement as recited in  claim 25  further comprising a first device capable of ascertaining an impact intensity of the peening material accelerated within the peening chamber, the first device being mounted the component being peened on a side of the component that faces away from the cover element. 
     
     
         39 . The peening chamber arrangement as recited in  claim 38  further comprising a second device capable of postmetering peening material to be accelerated within the peening chamber. 
     
     
         40 . The peening chamber arrangement as recited in  claim 39  wherein the second device is controllable as a function of the impact frequency ascertained by the first device. 
     
     
         41 . The peening chamber arrangement as recited in  claim 25  wherein the cover element is operated at an oscillation of a predefined frequency of 20 kHz or less, the oscillation preferably having an essentially rectangular waveform. 
     
     
         42 . The peening chamber arrangement as recited in  claim 25  wherein the cover element is operated at an oscillation of a predefined frequency of 20 kHz or less, the oscillation preferably having an essentially trapezoidal waveform. 
     
     
         43 . The peening chamber arrangement as recited in  claim 25  wherein the cover element is operated at an oscillation of a predefined frequency of 20 kHz or less, the oscillation preferably having an essentially rectangular and trapezoidal waveform.