US2009294405A1PendingUtilityA1

Methods of producing oscillator and apparatuses for producing oscillator

Assignee: CANON KKPriority: Jun 2, 2008Filed: May 29, 2009Published: Dec 3, 2009
Est. expiryJun 2, 2028(~1.8 yrs left)· nominal 20-yr term from priority
Inventors:Toshiyuki Ogawa
H10P 72/0604H10P 72/0426
49
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Claims

Abstract

A method of producing an oscillator includes a first step, a second step and a third step. In the first step, an oscillator is formed in a substrate immersed in an etchant, by wet etching. In the second step, the wet etching is stopped. In the third step, the oscillation of the oscillator in the etchant is excited, and the oscillating condition of the excited oscillator relevant to a target frequency of the oscillator is detected. The third step is performed at least once prior to the second step.

Claims

exact text as granted — not AI-modified
1 . A method of producing an oscillator, the method comprising:
 a first step of forming an oscillator in a substrate immersed in an etchant, by wet etching;   a second step of stopping the wet etching; and   a third step of exciting the oscillation of the oscillator in the etchant, and detecting the oscillating condition of the excited oscillator relevant to a target frequency of the oscillator, the third step being performed at least once prior to the second step.   
   
   
       2 . The method according to  claim 1 , wherein in the third step, the oscillating condition of the oscillator is detected by using an exciting unit for exciting the oscillation of the oscillator in the etchant, and a detecting unit for detecting the oscillating condition of the oscillator excited by the exciting unit, and in the second step, the wet etching is stopped when the detecting unit detects the oscillating condition of the oscillator reaching a resonance condition at the target frequency in the third step. 
   
   
       3 . The method according to  claim 1 , wherein a frequency of the oscillation excited in the third step is invariably set equal to the target frequency. 
   
   
       4 . The method according to  claim 1 , wherein a frequency of the oscillation excited in the third step is set to periodically change in a range including the target frequency. 
   
   
       5 . The method according to  claim 1 , wherein in the third step, energy for exciting the oscillation of the oscillator is transmitted to the oscillator through a medium of the etchant. 
   
   
       6 . The method according to  claim 1 , wherein in the third step, energy for exciting the oscillation of the oscillator is transmitted to the oscillator through a medium of a supporting unit for supporting the oscillator. 
   
   
       7 . The method according to  claim 1 , wherein the oscillating condition of the oscillator is optically detected in the third step. 
   
   
       8 . The method according to  claim 1 , wherein the oscillating condition of the oscillator is detected by detecting the oscillation of the etchant in the third step. 
   
   
       9 . The method according to  claim 1 , wherein the etchant includes an alkaline solution. 
   
   
       10 . The method according to  claim 1 , wherein the etchant includes a mixture acid of hydrofluoric acid and nitric acid. 
   
   
       11 . A wet etching apparatus for producing an oscillator, the apparatus comprising:
 an etching bath for storing an etchant;   an exciting portion for exciting the oscillation of an object to be etched; and   a detecting portion for detecting the oscillating condition of the object excited by the exciting portion in the etchant.

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