Exposure apparatus and device manufacturing method

Abstract

An exposure apparatus which exposes a substrate via a liquid, comprises: a projection optical system configured to project a pattern of a reticle onto the substrate; a substrate stage configured to hold the substrate and move; a top plate which is arranged on the substrate stage and in which an opening is formed; and a measurement member which is arranged in the opening formed in the top plate arranged on the substrate stage, wherein a gap is formed between the top plate and the measurement member in a plane perpendicular to an optical axis of the projection optical system, and wherein the measurement member is formed of one of a regular N-sided polygon (N>4) and a circle in the plane.

1 . An exposure apparatus which exposes a substrate via a liquid, comprising:
 a projection optical system configured to project a pattern of a reticle onto the substrate;   a substrate stage configured to hold the substrate and move;   a top plate which is arranged on the substrate stage and in which an opening is formed; and   a measurement member which is arranged in the opening formed in the top plate arranged on the substrate stage,   wherein a gap is formed between the top plate and the measurement member in a plane perpendicular to an optical axis of the projection optical system, and   wherein the measurement member is formed of one of a regular N-sided polygon (N>4) and a circle in the plane.   
   
   
       2 . An exposure apparatus which exposes a substrate via a liquid, comprising:
 a projection optical system configured to project a pattern of a reticle onto the substrate;   a substrate stage configured to hold the substrate and move;   a top plate which is arranged on the substrate stage and in which an opening is formed; and   a measurement member which is arranged in the opening formed in the top plate arranged on the substrate stage,   wherein a gap is formed between the top plate and the measurement member in a plane perpendicular to an optical axis of the projection optical system, and   wherein the top plate including a drainage unit configured to drain the liquid which has entered the gap.   
   
   
       3 . The apparatus according to  claim 2 , wherein
 the drainage unit is adjusted at a constant drainage velocity.   
   
   
       4 . An exposure apparatus which exposes a substrate via a liquid, comprising:
 a projection optical system configured to project a pattern of a reticle onto the substrate;   a substrate stage configured to hold the substrate and move;   a top plate which is arranged on the substrate stage and in which an opening is formed;   a measurement member which is arranged in the opening formed in the top plate arranged on the substrate stage and which has a front surface facing a rear surface of the top plate; and   a seal member arranged between the rear surface of the top plate and the front surface of the measurement member,   wherein a modulus of section of the seal member is smaller than a modulus of section of a circle.   
   
   
       5 . The apparatus according to  claim 5 , wherein the seal member includes a lip seal. 
   
   
       6 . A device manufacturing method comprising:
 exposing a substrate to light using an exposure apparatus defined in  claim 1 ; and   developing the exposed substrate.   
   
   
       7 . A device manufacturing method comprising:
 exposing a substrate to light using an exposure apparatus defined in  claim 2 ; and   developing the exposed substrate.   
   
   
       8 . A device manufacturing method comprising:
 exposing a substrate to light using an exposure apparatus defined in  claim 4 ; and   developing the exposed substrate.