Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process

Abstract

A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R 1 to R 5 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, acetoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.

1 . A photosensitive compound comprising:
 two or more structural units, in a molecule, represented by the following general formula (1):   
     
       
         
         
             
             
         
       
     
     wherein R 1  to R 5  are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, acetoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group. 
   
   
       2 - 3 . (canceled) 
   
   
       4 . A photosensitive compound comprising:
 two or more structural units, in a molecule, represented by the following general formula (4):   
     
       
         
         
             
             
         
       
     
     wherein X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group. 
   
   
       5 . A photosensitive compound comprising:
 two or more structural units, in a molecule, represented by the following general formula (5):   
     
       
         
         
             
             
         
       
     
     wherein X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group. 
   
   
       6 - 7 . (canceled) 
   
   
       8 . Carixarene comprising:
 hydrogen atoms of two or more phenolic hydroxyl groups substituted with a substituent represented by the following general formula (7):   
     
       
         
         
             
             
         
       
     
     wherein R 1  to R 5  are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, acetoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom. 
   
   
       9 . (canceled) 
   
   
       10 . A photosensitive composition comprising:
 at least one species of a photosensitive compound according to  claim 1 ; and   an organic solvent in which said at least one species of the photosensitive compound is dissolved.   
   
   
       11 - 18 . (canceled)