Formation of Conductive Templates Employing Indium Tin Oxide

Abstract

The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material.

1 . A nanoimprint lithography template comprising:
 a substrate having a mesa formed thereon, the mesa having a plurality of recessions and a plurality of projections with a nadir of the recessions formed of a first electrically conductive material that is substantially transparent to radiation.   
     
     
         2 . The nanoimprint lithography template of  claim 1 , wherein the plurality of projections are formed of a second electrically conductive material. 
     
     
         3 . The nanoimprint lithography template of  claim 2 , wherein an electromagnetic field proximate to a first recession formed of the first electrically conductive material is greater than an electromagnetic field proximate to a first protrusion formed of the second electrically conductive material, the first recession located adjacent to the first protrusion. 
     
     
         4 . The nanoimprint lithography template of  claim 1 , wherein the mesa is substantially transparent to a predetermined wavelength of radiation. 
     
     
         5 . The nanoimprint lithography template of  claim 1 , wherein the plurality of recessions provide a plurality of spaced-apart electrically conductive regions on the mesa. 
     
     
         6 . The nanoimprint lithography template of  claim 1 , wherein the substrate is formed of a material selected from a set of materials consisting essentially of quartz, fused-silica, silicon, sapphire, organic polymers, siloxane polymers, borosilicate glass, fluorocarbon polymers, and metal. 
     
     
         7 . The nanoimprint lithography template of  claim 1 , wherein the first electrically conductive material is indium tin oxide. 
     
     
         8 . The nanoimprint lithography template of  claim 1 , wherein the plurality of projections are formed of an insulative material. 
     
     
         9 . The nanoimprint lithography template of  claim 8 , wherein the electromagnetic field proximate to a first recession formed of the first electrically conductive material is greater than the electromagnetic field proximate to a first projection formed of an insulative material. 
     
     
         10 . The nanoimprint lithography template of  claim 1 , wherein the plurality of projections are formed of an insulative material and a second electrically conductive material. 
     
     
         11 . The nanoimprint lithography template of  claim 10 , wherein the insulative material is deposited atop of the second electrically conductive material. 
     
     
         12 . A nanoimprint lithography template, comprising:
 a substrate having a mesa thereon; and   a plurality of spaced-apart electrically conductive regions disposed on the mesa, with the substrate and the electrically conductive regions both being substantially transparent to a predetermined wavelength of energy.   
     
     
         13 . The nanoimprint lithography template of  claim 10 , wherein the predetermined wavelength of energy is ultra-violet radiation. 
     
     
         14 . The nanoimprint lithography template of  claim 10 , wherein the substrate is formed of a material selected from a set of materials consisting essentially of quartz, fused-silica, silicon, sapphire, organic polymers, siloxane polymers, borosilicate glass, fluorocarbon polymers, and metal. 
     
     
         15 . The nanoimprint lithography template of  claim 10 , wherein the plurality of spaced-apart conductive regions are formed from indium tin oxide. 
     
     
         16 . The nanoimprint lithography template of  claim 10 , further including a power supply connected to a subset of the plurality of spaced-apart conductive regions. 
     
     
         17 . The nanoimprint lithography template of  claim 14 , further including a processor connected to the power supply to direct application of electrical energy to the plurality of spaced-apart electrically conductive regions in a predetermined manner. 
     
     
         18 . The nanoimprint lithography template of  claim 14 , further including a processor connected to the power supply to direct sequential application of electrical energy to the plurality of spaced-apart electrically conductive regions. 
     
     
         19 . The nanoimprint lithography template of  claim 14 , wherein the subset further includes all of the plurality of spaced-apart electrically conductive regions. 
     
     
         20 . A nanoimprint lithography template comprising:
 a substrate having a mesa formed thereon;   a plurality of recessions formed in the mesa with a nadir of the recession formed of a first electrically conductive material transparent to radiation;   a plurality of protrusions formed on the mesa, the protrusions formed of an insulative material deposited on a second electrically conductive material transparent to radiation.